Here we investigate image formation properties of As₄₀S₄₀Se₂₀ layers with regard to their application for gratings fabrication. The light-sensitive properties (photo- and thermally-induced structural changes) of layers have been studied using optical techniques, including Raman spectroscopy. The dissolution kinetics of as - evaporated and exposed layers in amine based etching solutions has been studied. Characteristics of holographic gratings obtained on the base of As₄₀S₄₀Se₂₀ layers are presented.
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