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Content available remote Nanostructures with Ge–Si quantum dots for infrared photodetectors
EN
In this paper questions of optimization of growth conditions in the method of molecular beam epitaxy for creation of high-efficient quantum dot infrared photodetectors are considered. As a model material system for theoretical investigations, heterostructures with germanium-silicon quantum dots on the silicon surface are chosen. For calculations of the dependencies of quantum dots array parameters on synthesis conditions the kinetic model of growth of differently shaped quantum dots based on the general nucleation theory is proposed. The theory is improved by taking into account the change in free energy of nucleation of an island due to the formation of additional edges of islands and due to the dependence of surface energies of facets of quantum dots on the thickness of a 2D wetting layer during the Stranski–Krastanow growth. Calculations of noise and signal characteristics of infrared photodetectors based on heterostructures with quantum dots of germanium on silicon are done. Dark current in such structures caused by thermal emission and barrier tunneling of carriers, as well as detectivity of the photodetector in the approximation of limitation by generation-recombination noises are estimated. Moreover, the presence of dispersion of quantum dots by size is taken into account in the calculations of the generation-recombination noises. Results of calculations of the properties of structures with quantum dots and their dependencies on growth parameters, as well as the characteristics of quantum dot photodetectors are presented. Comparison of the estimated parameters of quantum dots ensembles and the characteristics of quantum dot photodetectors with experimental data is carried out.
EN
In this paper an analysis of tendencies of Ge on Si quantum dots nanoheterostructures’ usage in different optoelectronic devices such as, for example, solar cells and photodetectors of visible and infra-red regions is carried out; a complex mathematical model for calculation of dependency on growth conditions of self-organized quantum dots of Ge on Si grown using the method of molecular beam epitaxy parameters is described. Ways of segregation effect and underlying layers’ influence are considered. It is shown that for realization of good device characteristics quantum dots should have high density, small sizes, uniformity, and narrow size distribution function. The desirable parameters of arrays of square and rectangular quantum dots for device application are attainable under certain growth conditions.
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