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The impact of atomic layer deposition technological parameters on optical properties and morphology of Al2O3 thin films

Dobrzanski L. A., Szindler M., Szindler M., Hajduk B., Kotowicz S.

Optica Applicata

2015

Vol. 45, nr 4

573--583

This paper presents some results of investigations on aluminum oxide Al2O3 thin films prepared by the atomic layer deposition method on polished monocrystalline silicon. It has been described how the technological parameters of the deposition process, like the number of cycles and substrate temperature, influenced the optical properties and morphology of prepared thin films. Their physical and optical properties like thickness, uniformity and refractive index have been investigated with spectroscopic ellipsometry, atomic force microscopy and UV/vis optical spectroscopy.