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EN
Purpose. Existing knowledge about the appearance, thickness, and chemical composition of 37 phosphate coatings on titanium inside porous structures is insufficient. Such knowledge is 38 important for the design and fabrication of porous implants. 39 Methods. Metallic scaffolds were fabricated by selective laser melting of 316L stainless steel 40 powder. Phosphate coatings were deposited on Ti sensors placed either outside the scaffolds 41 or in the holes in the scaffolds. The electrochemically-assisted cathodic deposition of 42 phosphate coatings was performed under galvanostatic conditions in an electrolyte containing 43 the calcium and phosphate ions. The phosphate deposits were microscopically investigated; 44 this included the performance of mass weight measurements and chemical analyses of the content of Ca2+ and PO4 2‒ 45 ions after the dissolution of deposits. 46 Results. The thicknesses of the calcium phosphate coatings were about 140 and 200 nm for 47 isolated titanium sensors and 170 and 300 nm for titanium sensors placed inside pores. 48 Deposition of calcium phosphate occurred inside the pores up to 150 mm below the scaffold 49 surface. The deposits were rich in Ca, with a Ca/P ratio ranging between 2 and 2.5. 50 Conclusions. Calcium phosphate coatings can be successfully deposited on a Ti surface 51 inside a model scaffold. An increase in cathodic current results in an increase in coating 52 thickness. Any decrease in the cathodic current inside the porous structure is slight. The 53 calcium phosphate inside the pores has a much higher Ca/P ratio than that of stoichiometric 54 HAp, likely due to a gradual increase in Ca fraction with distance from the surface.
2
Content available remote Wytwarzanie struktur poprzez osadzanie powierzchniowe
PL
Na podstawie literatury przedstawiono wybrane metody osadzania powierzchniowego, takie jak: litografia, fizyczne osadzanie z fazy gazowej (PVD – Physical Vapor Deposition), chemiczne osadzanie z fazy gazowej (CVD – Chemical Vapor Deposition), osadzanie elektrochemiczne oraz metody wspomagane laserem, np. bezprądowe osadzanie chemiczne wspomagane laserowo (LEEP – Laser-Enhanced Electroless Plating) i chemiczne osadzanie z fazy gazowej wspomagane wiązką laserową (LCVD – Laser Chemical Vapor Deposition).
EN
On the basis of the literature shows some surface deposition method such as lithography, physical vapor deposition (PVD - Physical Vapor Deposition), chemical vapor deposition (CVD - Chemical Vapor Deposition), electrochemical deposition, and laser-assisted methods, for example. Electroless Laser-assisted chemical deposition (LEEP - Enhanced Laser electroless plating), and chemical vapor deposition assisted laser beam (LCVD - Laser chemical vapor deposition).
PL
W artykule przedstawiono wyniki badań mających na celu optymalizację warunków procesu nakładania powłok Ni-P z kąpieli o różnym składzie. Podstawowymi parametrami wpływającymi na przebieg procesu były: zawartość soli niklu, gęstość prądu katodowego, temperatura i pH kąpieli, mieszanie roztworu (500 obr/ min) lub brak mieszania oraz zawartość dodatków. Badano wpływ tych czynników na wydajność procesu elektroosadzania i jakość uzyskanych powłok. Wyselekcjonowane kąpiele wykorzystano do nakładania gradientowych powłok Ni-P. Wykonano analizę chemiczną zawartości fosforu w powłokach oraz badania przyczepności, odporności korozyjnej, mikrotwardości i mikrostruktury otrzymanych powłok gradientowych.
EN
Electrodeposition of Ni-P coatings has important advantages: permits to control the plating speed and chemical composition of the deposit. Several electrolytes were investigated in order to optimize parameters of electrodeposition Ni-P alloy coatings (current density, temperature, electrolyte's pH, content of additives).The influence of these parameters on electrodeposition process efficiency and properties of obtained coatings were examined. Two electrolytes were selected for plating gradient (multilayer) coatings. The content of phosphor in Ni-P alloy was analytically evaluated. Also, the adherence, microhardness, microstructure and corrosion resistance of gradient coatings were investigated. All these parameters were the same or better than for coatings obtained during chemical deposition. After thermal treatment at 400° C the microhardness of gradient coatings increased to the level typical for chromium coatings. Ni-P gradient coatings can replace chromium finishing which is based on hazardous chemicals and has to be limited because of environment protection.
EN
SWOT (identification of strengths, weaknesses, opportunities and threats) analysis and prereąuisite tree (PT) are very important methods in planning of certain technology development. These methods are often used during the realization of the "Foresight" - type projects, aimed at enhancing social and economic development of a country. This work presents a SWOT analysis carried out for two selected technologies of the coating and layer deposition: Pulsed Laser Deposition (PLD) and Electrochemical Deposition (ED) from aąueous solutions. On the basis of prereąuisite tree, the major barriers - according to the authors - that hinder the development and improvement of technology are presented. Potential methods of overcoming them are also proposed.
PL
W planowaniu tendencji rozwoju technologii ważną rolę odgrywają metody badawcze (analiza SWOT - analiza mocnych i słabych stron, szans i zagrożeń oraz drzewo osiągania celów - prereąuisite tree) stosowane przy realizacji projektów typu "Foresight" mających na celu socjoekonomiczny rozwój kraju. W pracy zaprezentowano analizę SWOT przeprowadzoną dla dwóch wybranych technologii wytwarzania warstw i powłok: osadzanie laserem impulsowym (PLD) oraz elektrochemicznego osadzania z roztworów wodnych (ED). Na podstawie drzewa osiągania celów wskazano główne, zdaniem autorów, bariery utrudniające rozwój i doskonalenie rozważanych technologii, a także zaproponowano potencjalne sposoby ich pokonania.
EN
The Co-Ni-Mo alloy powders were electrochemically deposited from alkaline ammonical electrolyte containing two or three different elements, Co, Ni and/or Mo at a constant current density. The obtained Co-Ni-M powders were studied using EDS, XRay and SEM analysis. Based on the obtained experimental results it can be concluded that by appropriate selection of chemical composition of the electrolyte for deposition, varying of Co, Ni and Mo ions ratios and current density it can be influenced on the particle sizes of deposited powders. X-ray results suggest that the obtained powders have amorphous structure.
EN
Ni/Cu multilayers have been obtained by electrodeposition method from a single bath realized by cyclic changes of deposition current densities of Ni and Cu sublayers. In order to determine the current conditions of Ni/Cu multilayer deposition, the potentiodynamic characteristics of the course of processes present during nickel and copper deposition were determined. The character of the potential changes in time of the multilayer electrodeposition, depending on a current density of copper deposition (at constant current density of nickel deposition) was analysed. The cross-sectional micrograph, confirmation of metal multilayer formation and the chemical composition of electrodeposited multilayers were obtained using a scanning electron microscopy. Quantitative chemical analysis of the electrodeposited multilayers shows that deposition of a copper sublayer at current densities of iCu=1, 0.5 and 0.2 mA/square cm is accompanied by nickel co-deposition. The nickel content decreases with decrease in the current density of copper sublayer deposition and is 73, 18 and 4 at.%, respectively. It was ascertained that depolarisation of nickel and overpolarisation of copper phenomena, are accompanied by deposition of Ni/Cu multilayers. The optimal for the sake of chemical composition, current condition of Ni/Cu multilayers electrodeposition from the bath containing Ni(SO3NH2)2x4H2O, CuSO4x5H2O and H3BO3 were proposed from the print of view of chemical composition. The current densities are found to be: iNi=20 mA/square cm and iCu below 0.2 mA/square cm.
PL
W niniejszej pracy przeprowadzono elektrolityczne osadzanie na podłożu miedzi wielokrotnych naprzemiennych warstw Ag (osadzanych z kąpieli cyjankowych) oraz Ni (osadzanych z kąpieli kwaśnych). Ustalono optymalny potencjał osadzania (-1000 mV w stosunku do nasyconej elektrody kalomelowej), przy którym osadzane warstwy były ciągłe i przyczepne do podłoża. Przy pomocy mikroskopu skaningowego zaobserwowano naprzemienne warstwy o grubości 50 nm każda. Podjęto próby obserwacji tych warstw na transmisyjnym mikroskopie elektronowym przy pomocy techniki triafolowych replik celowanych napylanych węglem i złotem. Uzyskano dobre odwzorowanie powierzchni, ale nie natrafiono na obserwowanych fragmentach replik na obszary obejmujące wielokrotne warstwy. Technika ta po jej dopracowaniu rokuje nadzieje na obserwację supersieci o grubości warstw rzędu 1 nm.
EN
In this paper electrochemical deposition of Ag-Ni multilayers on the Cu substrate from cyanide and acid baths is presented. Optimal deposition potential (-1000 mV SCE) was determined, at which deposited layers were of good quality and adherence. Using scanning electron microscope, multilayers of 50 nm thick were observed. Some efforts were made to observe those layers in STM using the triafole replica technique (vacuum sputtered with carbon and gold). Satisfying representation of the surface was obtained but in the observed fragments one could not find superlattices. Nevertheless, after ameliorating, this technique may let us observe superlattices built from layers 1 nm thick.
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