Wyniki wyszukiwania - BazTech

Ograniczanie wyników

Znaleziono wyników: 1

Liczba wyników na stronie

Wyniki wyszukiwania

Wyszukiwano:
w słowach kluczowych: dual gate oxide

Sortuj według:

Ogranicz wyniki do:

Applying shallow nitrogen implantation from rf plasma for dual gate oxide technology

Bieniek T., Beck R. B., Jakubowski A., Głuszko G., Konarski P., Ćwil M.

Journal of Telecommunications and Information Technology

2007

nr 3

3-8

The goal of this work was to study nitrogen implantation from plasma with the aim of applying it in dual gate oxide technology and to examine the influence of the rf power of plasma and that of oxidation type. The obtained structures were examined by means of ellipsometry, SIMS and electrical characterization methods.