The aim of this work is to study a possibility of field electron emission from carbon layers produced by radio frequency plasma chemical vapor deposition (RF PCVD) method. A correlation between electric parameters of the layers and the ability to produce electron emission is also studied through material (AFM) and electrical (C-V, I-V) characterization of the obtained layers. It is demonstrated that the layers deposited with the highest self-bias exhibit the highest capacity for electron emission.
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