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Electro-optical properties of diluted GaAsN on GaAs grown by APMOVPE

Kamyczek P., Biegański P., Płaczek-Popko E., Zielony E., Gelczuk Ł., Sciana B., Pucicki D., Radziewicz D., Tlaczala M, Kopalko K., Dabrowska-Szata M.

Materials Science Poland

2013

Vol. 31, No. 4

595--600

In this paper we report on the optical and electrical studies of single GaAs1-xNx epitaxial layers grown on GaAs substrates by means of atmospheric pressure metal organic vapour phase epitaxy (APMOVPE). Three kinds of samples with 1.2 %, 1.6 % and 2.7 % nitrogen content were studied. Optical properties of the layers were investigated with the use of room temperature transmittance and reflectance measurements. Subsequently Schottky Au–GaAs1-xNx contacts were processed and characterized by current-voltage (I-V) and capacitance-voltage (C-V) measurements within 80 – 480 K temperature range. From the I-V and C-V characteristics the ideality factor, series resistance and built-in potential were determined. Obtained diodes can be used for further studies on defects with the use of DLTS method.

DC and low-frequency noise analysis for buried SiGe channel metamorphic PMOSFETs with high Ge content

Durov S., Mironov O. A., Myronov M., Whall T. E., Parker E. H. C., Hackbarth T., Hoeck G., Herzog H. J., König U., Känel von H.

Journal of Telecommunications and Information Technology

2005

nr 1

101-111

Measurements of current drive in p-Si1-xGex MOSFETs, with x = 0.7, 0.8 reveal an enhancement ratio of over 2 times as compared to a Si device at an effective channel length of 0.55 žm. They also show a lower knee voltage in the output I-V characteristics while retaining similar values of drain induced barrier lowering, subthreshold swing, and off current for devices with a Sb punch-through stopper. For the first time, we have quantitatively explained the low-frequency noise reduction in metamorphic, high Ge content, SiGe PMOSFETs compared to Si PMOSFETs.