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The Magnetic and Electric Measurements of the Multiferroic PbFe1/2Nb1/2O3 Ceramics Obtained Using Hot Uniaxial Pressure Method

Bochenek D., Skulski R., Niemiec P., Brzezińska D., Rogacki K.

Archives of Metallurgy and Materials

2018

Vol. 63, iss. 3

1243--1247

We present the results of investigations of Pb(Fe1/2Nb1/2)O3 (PFN) ceramic samples obtained using two-step synthesis (i.e. columbite method). For obtained samples complex investigations of microstructure, magnetic and electrophysical properties have been performed at low and at high temperatures. Microstructure is characterized by small grains with high homogeneity and high density (low porosity). Impedance of samples and the phase shift angle have been measured using LCR Meter. Next the AC electric conductivity, dielectric permittivity and loss tangent have been calculated. AC conductivity at frequency 3 Hz was measured in similar way using Quantum Design PPMS System in magnetic fields 1000 Oe and 10000 Oe. At temperature range 240 K - 260 K the anomalies of conductivity are observed. These anomalies depend on measuring cycle (heating, cooling) and magnetic field.

Fabrication of thin metallic films by arc discharges under ultra-high vacuum conditions

Strzyżewski P., Sadowski M. J., Nietubyć R., Rogacki K., Paryjczak T., Rogowski J.

Materials Science Poland

2008

Vol. 26, No. 1

213--220

Cathodic arc deposition technology offers an excellent approach to producing pure metal, alloy and compound films at very high rates and with excellent adhesion and density. High ion energy is the main factor allowing one to produce more compact films, with much stronger adhesion to the substrate than those obtained by other methods. It was shown that the cathodic arc working in ultra-high vacuum (UHV) conditions solves the problem of the oxygen contamination originating from water vapour thus paving the road to applications where very pure metallic films are needed. The paper presents systems used for deposition of thin coatings by means of arc discharges performed under the UHV conditions. The most important experimental results and characteristics of the arc-deposited thin superconducting films are discussed, and the progress achieved recently in the formation of such films is described.