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Influence of atmosphere composition on the structure and properties of aluminum oxynitride coatings deposited by PLD method

100%

Piwowarczyk J. , Jędrzejewski R. , Baranowska J.

tom Vol. 37, nr 1

23--28

This work presents studies on the influence of oxygen content in reaction atmosphere during pulsed laser deposition on the structure and properties of aluminium oxynitride films. The coatings were grown on monocrystalline Si substrates. Aluminium nitride bulk disk was used as a target. The film deposition took place at room temperature and pressure of 0.5 Pa with varying content of oxygen and nitrogen. Thickness and roughness of the coatings were measured by profilometer. The X-ray diffractometer (XRD) was used for phase analysis of the coatings. Chemical composition was evaluated using X-ray microanalysis (EDS) by means of scanning electron microscopy (SEM). The surface topography was examined using an atomic force microscopy (AFM). Hardness of the coatings was measured by means of nanoindentation. Adhesion was evaluated in microscratch tests and the morphology of the residual scratch was characterized by AFM. Results showed that it was possible to obtain coatings composed of oxynitrides with different stoichiometry. Mechanical properties of the obtained coatings, however, were significantly different from those demonstrated by ALON ceramic. The content of oxygen in the coatings had an influence on the decreasing hardness and Young’s modulus and improved adhesion. There was no influence on thickness and roughness but the lowest number of droplets was noticed in the coatings obtained in pure oxygen.

Celem pracy było zbadanie wpływu zawartości tlenu w atmosferze roboczej na budowę i właściwości powłok z tlenoazotku glinu osadzanych metodą pulsacyjnej ablacji laserowej (PLD).

Pulsed laser deposition of ZnO and MoO3 as reflection prohibitors on photovoltaic cell substrate to enhance the efficiency

84%

Selvan P. , Jebaraj D. J. J. , Hynes N. R. J.

tom Vol. 113, nr 2

65--71

Purpose: With the ever-growing demand for conventional fuels, the improvement in the efficiency of the photovoltaic system is the need of the hour. Antireflection coatings enhance the availability of solar power by reducing the percentage of light reflected. A new coating has been developed to improve the solar cell's overall efficiency. This study focuses on enhancing the efficiency of the monocrystalline solar cell when a coating of ZnO-MoO3 is applied at a certain thickness. Design/methodology/approach: A layer of ZnO followed by MoO3 is deposited on a Silicon solar cell substrate using a Pulsed Laser Deposition process. Due to the transmissivity d between the two materials, they act as excellent antireflection coating. The layer thickness has been engineered to lie in the maximum absorption spectrum of monocrystalline silicon solar cells, which is between 400 and 800 nanometers. Findings: Based on the calculation of transmissivities for a given layer thickness of coating material, the coating has been done, and the efficiencies of the coated specimen were compared with the uncoated solar cell. The percentage improvement in the electrical efficiency of a single crystalline silicon solar cell with an anti-reflection coating at 1059 W/m2 is about 35.7%. Research limitations/implications: Among the available antireflection coating materials, the combination that provides better efficiency when coated on top of a solar cell is hard to find. Practical implications: This anti-reflection coating could be a better solution to enhance the overall efficiency of the single crystalline silicon solar cell. Originality/value: Although ZnO and MoO3 coatings have been investigated separately for improvement in solar cell efficiency with varying levels of success, the hybrid coating of ZnO/MoO3 with a performance enhancement of 35.7% is a great leap.