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Photoresistor based on ZnO nanorods grown on a p-type silicon substrate

100%

Witkowski B. S. , Pietruszka R. , Gieraltowska S. , Wachnicki L. , Przybylinska H. , Godlewski M.

2017

tom Vol. 25, No. 1

15--18

In this work we discuss a method of preparation of a highly sensitive light detector based on ZnO nanorods. A photoresistor constructed by us is based on a heterojunction between high quality ZnO nanorods and high resistivity p-type Si used as a substrate for nanorods’ deposition. ZnO nanorods are grown by a modified version of a microwave assisted hydrothermal method which allows for growth of high quality ZnO nanorods in a few minutes. The obtained photoresistor responds to a wide spectral range of light starting from near infrared (IR) to ultraviolet (UV). Properties of the detector are evaluated. We propose the use of the detector as an optical switch.

Demonstration of HOT photoresponse of MWIR T2SLs InAs/InAsSb photoresistors

72%

Michalczewski K. , Tsai T. Y. , Martyniuk P. , Wu C. H.

tom Vol. 67, nr 1

141--145

We report on the photoresponse of mid-wavelength infrared radiation (MWIR) type-II superlattices (T2SLs) InAs/InAsSb high operating temperature (HOT) photoresistor grown on GaAs substrate. The device consists of a 200 periods of active layer grown on GaSb buffer layer. The photoresistor reached a 50% cut-off wavelength of 5 μm and 6 μm at 200 K and 300 K respectively. The time constant of 30 ns is observed at 200 K under 1 V bias. This is the first observation of the photoresponse in MWIR T2SLs InAs/InAsSb above 200 K..