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2 Journal of Achievements in Materials and Manufacturing Engineering

2 2009

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Influence of the vacuum-arc source configuration and arc discharge parameters on the evolution and location of arc spots on the cathode surface

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Walkowicz J. , Smolik J. , Słomka Z. , Kułakowska-Pawlak B. , Żyrnicki W.

2009

tom Vol. 37, nr 2

719-725

Purpose: The paper presents investigations of the evolution, structure and location of arc spots on the cathode frontal surfaces of two types of industrial arc sources. Design/methodology/approach: The temporal behaviour of cathode spots was recorded with the use of a fast CCD camera. The experiments were performed at four values of arc current, nine compositions of the process atmosphere N2+C2H2 and three pressure ranges of the process atmosphere. Findings: The analysis of the recorded pictures revealed the fine structure of the arc discharge for the investigated range of process conditions. Both temporal and spatial behaviour of cathode spots were different for both investigated arc sources. The correspondence between radial distributions of the cathode spots on the cathode surface and radial distribution of plasma flow elements analysed in the volume of the vacuum chamber was revealed. Research limitations/implications: The paper show experimental methodology that can be used for the research of the specificity of cathode spots movement on the cathodes made from different materials. Originality/value: The originality of the research presented in the paper consists in assigning overall correlation between vacuum-arc source configuration and parameters of vacuum-arc discharge – on the one hand, and space-time behaviour of the arc spots during their movement on the circular cathode surface and radial distribution of excited and ionized atoms of the cathode material in the deposition chamber – on the other.

Correlation between spatial distribution of the components of reactive plasma flow and the stoichiometry and defectiveness of deposited coatings

80%

Walkowicz J. , Smolik J. , Brudnias R. , Kułakowska-Pawlak B. , Żyrnicki W.

2009

tom Vol. 37, nr 2

712-718

Purpose: The subject of the presented research was reactive plasma generated by circular vacuum-arc sources used for deposition of thin hard coatings. Design/methodology/approach: Experimental investigations on spatial distribution of ionized and excited plasma components were performed with the use of the optical emission spectroscopy. Quantitative analysis of microdroplets distribution was carried out using measuring optical microscope supplied with the numerical image analysis system. Findings: Based on the obtained radial distributions of volatile and condensed components the general picture of plasma flow emitted by a single circular arc source was reconstructed. Radial distributions of analysed emitting elements and analysed fractions of microdroplets showed layered structures that depended on the discharge conditions. Research limitations/implications: The spectral method used for the reconstruction of concentration distributions of ionised and excited plasma components generated by a single circular arc source could not be used for reconstruction of such distributions in the vacuum chamber of the industrial device. Originality/value: The carried out investigations showed that the differences in spatial distributions of plasma active elements determine the uniformity of crystallization conditions in vacuum-arc deposition processes performed in large-scale multi-source industrial devices.