The aim of this work was to improve the quality of the GaSb buffer layers on GaAs substrates using the molecular beam epitaxy (MBE) technology. The high quality of the GaSb buffer layers is one of the most important elements enabling the synthesis of good quality of type- II superlattices (T2SL) structures for infrared applications. The main challenges in this regard are: compensation of the difference in lattice constants between GaAs and GaSb and obtaining the highest achievable surface quality of the final GaSb layer. In the literature, many authors describe different techniques to obtain the best quality of a GaSb buffer layer. In this work, we present the results of HRXRD, AFM, TOF-SIMS, SEM, and Nomarski optical microscope measurements obtained for 2 μm thick GaSb buffer layers. The GaSb layers are made according to different techniques and these results are compared with a GaSb buffer construction technique according to our own technology. During the processes, we also obtained an unintentional structure of one of the buffer layers, which allowed us to obtain very good results in terms of surface structure and crystallographic quality where FWHM in 𝜔𝑅𝐶 scan was equal to 138 arcsec and RMS 0.20 nm proving that there is still a lot of work to be done in this area.
Do otrzymywania monokryształów antymonku galu (GaSb) została wybrana metoda Czochralskiego. Zbadano wpływ parametrów technologicznych procesu na właściwości niedomieszkowanych monokryształów GaSb. Otrzymano niedomieszkowane monokryształy o orientacji <111> oraz <100> o koncentracji nośników p< 2·10¹⁷ cm⁻³ oraz ruchliwości u > 600 cm²/Vs mierzonej w 300K. Przeprowadzono próby domieszkowania antymonku galu na typ n przewodnictwa (domieszkowanie tellurem) oraz na typ p przewodnictwa (jako domieszki użyto krzem). W obu przypadkach otrzymano monokryształy o orientacji <100>.
EN
Gallium antimonide (GaSb) single crystals were grown by Czochralski method. The influence of technological parameters on GaSb parameters has been investigated. Undoped <111> and <100> oriented GaSb single crystals were obtained with carrier concentration p < 2·10¹⁷ cm⁻³ and mobility μ > 600 cm²/Vs (measured in 300K). Gallium antimonide doping were done for n-type of conductivity (by tellurium) and for p-type (by silicon). In both cases <100> oriented single crystals were obtained.
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