Copper sulfide-selenide (CuS0.2Se0.8) thin films were deposited on FTO coated glass substrate (fluorine doped tin oxide) and stainless steel substrates using electrodeposition technique. Deposited thin films were characterized using different characterization techniques viz. X-ray diffraction (XRD), scanning electron microscopy (SEM), UV-Vis spectroscopy, photoluminescence spectroscopy and surface wettability. XRD study showed polycrystalline nature with cubic phase of the films. Scanning electron microscopy showed that the surface area of the substrate was covered by the nanoplatelets structure of a thickness of 140 to 150 nm and optical study showed that the direct band gap was similar to 1.90 eV. Surface wettability showed hydrophobic nature of the CuS0.2Se0.8 thin films.
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