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1 Materials Science Poland

1 2004

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The effect of film thickness on physical properties of fluorine-doped indium oxide thin films

100%

Rozati S. M. , Ganj T.

tom Vol. 22, No. 2

93--97

In this paper, fluorine-doped indium oxide films of thicknesses ranging from 115 nm to 1290 nm were prepared using the spray pyrolysis technique by varying the amount of spray solution and keeping constant the substrate temperature, doping concentration and air flow rate. The preferential growth orientation was determined using the X-ray diffraction (XRD) spectra of doped indium oxide films of various thicknesses. The sheet resistance decreases gradually with the film thickness and reaches a stable value. It has also been observed that an increase in thickness deteriorates the optical properties of the deposited films beyond some limit.