Warianty tytułu
Application of surface active compounds for texturization of silicon surfaces
Języki publikacji
Abstrakty
W artykule przeanalizowano teksturowanie podłoży krzemowych Si(100) w roztworach wodorotlenków alkalicznych z dodatkami związków powierzchniowo czynnych. Przedstawiono utrudnienia technologiczne związane ze stosowaniem dodatków alkoholowych i zaproponowano nowy roztwór do teksturyzacji. Powszechnie stosowane w procesie alkohole (izopropanol, tert-butanol) zostały zastąpione diolami (alkoholami dwuwodorotlenowymi). Przedstawiono wyniki teksturowania w roztworze KOH z 1,2-pentanediolem. Dokonano optymalizacji składu roztworu i warunków trawienia. Wykonano pomiary współczynnika odbicia światła dla podłoży steksturowanych i dla podłoży pokrytych dodatkowo warstwą antyrefleksyjną. Współczynnik ten dla optymalnych warunków trawienia (1 M KOH+ 2% 1,2-pentanediolu, 90°C, 20 min) wynosił około 10% i był porównywalny ze współczynnikiem odbicia dla podłoży trawionych w KOH z izopropanolem. Niewątpliwe zalety roztworów z diolami (wyższa temperatura procesu, krótszy czas trawienia, ułatwienia technologiczne) wskazują, że mogą one z powodzeniem zastąpić dotychczas stosowane roztwory.
Texturization of Si(100) surfaces in alkaline solutions with addition of surface active compounds was investigated in this paper. Technological difficulties connected with the application of alcohol additives were presented and the new composition of the etching solution for texturization was proposed. The commonly used alcohols such as isopropanol or tert-butanol were replaced by diols (alcohols containing two hydroxyl groups). The results of texturization in KOH solution with 1,2-pentanediol were shown. Optimization of the solution composition and the etching conditions was carried out. The coefficient of light reflection was measured for the textured surfaces with and without an additional anti-reflection coating. The coefficient obtained in the optimal etching conditions (1 M KOH+ 2% 1,2-pentanediol, 90°C, 20 min) was about 10% and was comparable to the reflection coefficient of the surfaces textured in the KOH+IPA solution. Because of the unquestionable advantages such as higher process temperature, shorter etching time and technological improvements, the etching solutions with diols can successfully replace hiherto used texturing solutions.
Rocznik
Tom
Strony
9-12
Opis fizyczny
Bibliogr. 19 poz., wykr.
Twórcy
autor
autor
autor
autor
- Politechnika Wrocławska, Wydział Elektroniki Mikrosystemów i Fotoniki
Bibliografia
- [1] Yuan Fulong, Guo Yongfeng, Liang Yingchun, Yan Yongda, Fu Hong-gang, Cheng Kai, Luo Xichun: Micro-fabrication of crystalline silicon by controlled alkali etching, Journal of Materials Processing Technology 149,,(2004), 567-572.
- [2] Zhenqiang Xi, Deren Yang, Wu Dan, Chen Jun, Xianhang Li, Duanlin Quo: Inwestigation of texturization for monocrystalline silicon solar cells with different kinds of alkaline, Renewable Energy 29 (2004), 2101-2107.
- [3] Chen Jian Wu, Pal-JenWei and Jen Fin Lin: Reflectivity of an etched silicon surface with pyramids. II. Experimental results from different etching conditions, J. Micromech Microeng. 19 (2009), 125019 (6pp).
- [4] Ou Weiying, Zhang Yao, Li Hailing, Zhao Lei, Zhou Chunlan, Diao Hongwei, Liu Min, Lu Weiming, Zhang Jun and Wang Wenjing: Texturization of mono-crystalline silicon solar cells in TMAH without the addition of surfactant, Journal of Semiconductors. 31 (2010), 106002.
- [5] Singh P. K., Kumar R., Lal M., Singh S. N., Das B. K.: Effectiveness of anisotropic etching of silicon in aqueous alkaline solutions, Solar Energy Materials & Solar Cells 70 (2001), 103-113.
- [6] Fornies E., Zaldo C., Albella J. M.: Control of random texture of monocrystalline silicon cells by angle-resolved optical reflectance, Solar Energy Materials & Solar Cells 87 (2005), 583-593.
- [7] Hayoung Park, Joon Sung Lee, Hee Jin Lim and Donghwan Kim: The Effect of Tertiary-Butyl Alcohol on the Texturing of Crystalline Silicon Solar Wells, Journal of the Korean Physical Society, Vol 55, No. 5, 2009, pp 1767-1771.
- [8] Papet P., Nichiporuk O., Fave A., Kaminski A., Bazer-Bachi B., Lemiti M.: TMAH texturisation and etching of interdigitated back-contact solar cells. Materials Science-Poland. Vol. 24, No. 4, 2006, 1042-1049.
- [9] Papet P., Nichiporuk O., Kaminski A., Rozier Y., Kraiem J., Lelievre J.-F.,Chaumartin A., Fave A., Lemiti M.: Pyramidal texturing of silicon solar cell with TMAH chemical anisotropic etching, Solar Energy Materials & Solar Cells, 90 (2006), 2319-2328.
- [10] Nishimoto Y., Samba K.: Investigation of texturization for crystalline Silicon solar cells with sodium carbonate solutions, Solar Energy Materials & Solar Cells, 61 (2000), 393-402.
- [11] Vallejo B., Gonzalez-Manas M., Martinez-Lopez J., Caballero M. A.: On the texturization of monocrystalline silikon with sodium carbonate solutions, Solar Energy, 81 (2007), 565-569.
- [12] Gangopadhyay U., Kim K. H., Dhungel S. K., Manna U., Basub P. K., Banerjeec M., Sahac H., Junsm Yi: A novel low cost texturization method for large area commercial mono-crystalline silicon solar Cells, Solar Energy Materials & Solar Cells, 90 (2006), 3557-3567.
- [13] Zhenqiang Xi, Deren Yang, Duanlin Quo: Texturization of monocrystalline silicon with tribasicsodium phosphate. Solar Energy Materials & Solar Cells, 77 (2003), 255-263.
- [14] Marrero N., Gonzalez-Diaz B., Guerrero-Lemusa R., Borchert D., Hemandez-Rodriguez C.: Optimization of sodium carbonate texturization on large-area crystalline silicon solar Wells, Solar Energy Materials & Solar Cells, 91 (2007), 1943-1947.
- [15] Gangopadhyay U., Kyunghae Kimb, Ajoy Kandolb, Junsin Yi, Saha H.: Role of hydrazine monohydrate during texturization of large-area crystalline silicon solar cell fabrication, Solar Energy Materials & Solar Cells, 90 (2006), 3094-3101.
- [16] Honghao Li, Weifeng Liu, Aimin Liu, Fen Qiao, Zengquan Hu, Yiting Liu: Metal grids-based texturization of monocrystalline silicon wafers for solar cells, Solar Energy Materials & Solar Cells, 94 (2010), 942-945.
- [17] Chu A. K., Wang J. S., Tsai Z. Y., Lee C. K.: A simple and cost-effective approach for fabricating pyramids on crystalline silicon wafers, Solar Energy Materials & Solar Cells, 93 (2009), 1276-1280.
- [18] Zubel I., Krakowska M.: Development of etch hillocks on different Si(hkl) planes in silicon anisotropic etching. Surface Science, 603 (2008), 1712-1721.
- [19] Zubel I., Rola K., Kramkowska M.: Model of Etching of Si(hkl) Substrates in KOH Solutions Saturated and Non-saturated with Isopropyl Alcohol, Sensors and Actuators A, 171 (2011), 436-445.
Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.baztech-article-BWA9-0045-0001