Czasopismo
2000
|
Vol. 8, No. 4
|
353-355
Tytuł artykułu
Autorzy
Wybrane pełne teksty z tego czasopisma
Warianty tytułu
Konferencja
The E-MRS European Conference on Photovoltaics ; ( 25.10-27.10.1999)
Języki publikacji
Abstrakty
In this work application of porous silicon (PS) to c-Si solar cells is presented. The PS layer is formed between the fingers of the Al grid contact by the method of stain etching. The short circuit current, Isc, of the solar cells with PS between the grid contacts increases of 30-40% comparing with the solar cell without PS. The open circuit voltage decreases a little probably due to decreasing doping concentration of P in n+ - diffused layer, after stain etching, when 80 nm of it is converted to PS. The value of a fill factor does not change significantly. The spectral dependence of Isc demonstrates that it increases in the whole spectral region. This could be related to a decrease in reflectivity and partially to an increase in transparency of the emitter after PS formation.Tthe efficiency of solar cells increases of about 25-30%.
Słowa kluczowe
Czasopismo
Rocznik
Tom
Strony
353-355
Opis fizyczny
Bibliogr. 6 poz.
Twórcy
autor
- Central Laboratory for Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia, Bulgaria, doriana@phys.bas.bg
Bibliografia
Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.baztech-article-BWA1-0001-1014