Warianty tytułu
Języki publikacji
Abstrakty
A multilayer heterostructure of GaAs/AlAs/GaAs/AlGaAs/GaAs, which was prepared by molecular beam epitaxy at the Institute of Electron Technolgy was analysed by high-resolution transmission electron microscpoy (HRTEM) with the aid of image simulation and image processing. In spite of specimen damage during ion-milling Tem specimen preparation, columns of Ga and As atoms in the GaAs and columns of Al and As atoms in the AlAs were positioned in the (110) HRTEM images. The average and the variance of the widths of AlAs, GaAs, and AlGaAs layers were estimated from a small-ange scattering image reconstructed from the HRTEM image.
Słowa kluczowe
Czasopismo
Rocznik
Tom
Strony
348-353
Opis fizyczny
Bibliogr. 16 poz.
Twórcy
autor
autor
autor
- Kyoto Institute of Technology, Matsugasaki, Kyoto 606-8585, Japan
Bibliografia
Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.baztech-article-BWA1-0001-0670