Structural and surface properties of TiO2 thin films doped with neodymium deposited by reactive magnetron sputtering

• Autorzy: Mazur, M. , Kaczmarek, D. , Domaradzki, J.
• Języki publikacji: EN

Abstrakty

EN

Thin films were deposited using modified, high energy magnetron sputtering method from Ti-Nd mosaic targets. The amount of neodymium dopant incorporated into two sets of thin films was estimated to be 0.8 and 8.5 at.%, by means of energy dispersive spectroscopy. On the basis of x-ray diffraction method, the type of crystalline structure and crystallites size were evaluated directly after the deposition process and after additional post-process annealing at 800 °Ctemperature. The influence of annealing on the surface properties was evaluated with the aid of atomic force microscopy. Uniformity of the dopant distribution in titanium dioxide matrix was examined with the aid of secondary ion mass spectroscopy. Additionally, using atomic force microscope, diversification and roughness of the surface was determined. Chemical bonds energy at the surface of TiO2:Nd thin films was investigated by x-ray photoelectron spectroscopy method. Wettability measurements were performed to determine contact angles, critical surface tensions and surface free energy of prepared coatings. On the basis of performed investigations it was found, that both factors, the amount of neodymium dopant and the post-process annealing, fundamentally influenced the physicochemical properties of prepared thin films.

Słowa kluczowe

EN

TiO2; neodymium; physicochemical properties; magnetron sputtering

• Czasopismo: Materials Science Poland
• Rocznik: 2013
• Tom: Vol. 31, No. 1
• Strony: 71-79
• Opis fizyczny: Bibliogr. 38 poz., rys., wykr.

Twórcy

autor

Mazur, M.

autor

Kaczmarek, D.

autor

Domaradzki, J.

• Wrocław University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wrocław

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