Czasopismo
2009
|
Vol. 39, nr 4
|
881-888
Tytuł artykułu
Autorzy
Wybrane pełne teksty z tego czasopisma
Warianty tytułu
Języki publikacji
Abstrakty
This paper presents the results of research of Cu/Ni multilayers magnetron-deposited on an Si (100) substrate. The thickness of Cu sublayers was identical in all multilayers and equalled 2 nm. The thickness of Ni sublayers varied between 1.2 and 3.0 nm. The surface topography of the multilayers was examined using the AFM (research of different areas). The interface roughness and period thickness were characterized by X-ray reflectometry (XRR). The roughness of the multilayers achieved by the XRR method was very similar for all 0.6 nm samples examined. However, the values of the roughness parameter Ra obtained by AFM examination were in the range of 0.09-0.32 nm, and depended on the size of the area examined. Based on the function obtained from the AFM measurements, taken on surface areas varying in size, an area of 1.5-4.0 cm2 was determined, for which an agreement between the roughness parameter, as determined by the AFM method, and the XRR method results would be expected.
Czasopismo
Rocznik
Tom
Strony
881-888
Opis fizyczny
bibliogr. 8 poz.,
Twórcy
autor
autor
autor
- Institute of Materials Engineering, Częstochowa University of Technology, Armii Krajowej 19, 42-200 Częstochowa, Poland
Bibliografia
- [1] BUSIAKIEWICZ B., ŁUŻNIAK I., ZASADA I., A discussion of the layer dependent magnetization behaviour in the Co/Ni/Cu(100) and Ni/Cu/Ni/Cu(100) systems, Thin Solid Films 517(5), 2009, pp. 1841–1847.
- [2] DONG CHENG, ZHI JUN YAN, LI YAN, Misfit dislocation network in Cu/Ni multilayers and its behaviors during scratching, Thin Solid Films 515(7–8), 2007, pp. 3698–3703.
- [3] BARSHILIA H.C., RAJAM K.S., Characterization of Cu/Ni multilayer coatings by nanoindentation and atomic force microscopy, Surface and Coatings Technology 155(2–3), 2002, pp. 195–202.
- [4] CHENGTAO YANG, SHUREN ZHANG, JIAHUI LUO, YAN LI, YANRONG LI, Research of optical and structural properties in Cu/Ti multilayer films, Vacuum 80(4), 2005, pp. 317–323.
- [5] SOLINA D.M., CHEARY R.W., LUPSCHA F.A., SWIFT P.D., An investigation of metal thin films using X-ray reflectivity and atomic force microscopy, [In] Advances in X-ray Analysis, Vol. 40, JCPDS – International Centre for Diffraction Data, 1997.
- [6] TIILIKAINEN J., TILLI J.-M., BOSUND V., MATTILA M., HAKKARAINEN T., SORMUNEN J., LIPSANEN H., Accuracy in x-ray reflectivity analysis, Journal of Physics D: Applied Physics 40(23), 2007, pp. 7497–7501.
- [7] KOLBE M., BECKHOFF B., KRUMREY M., ULM G., Thickness determination for Cu and Ni nanolayers: Comparison of completely reference-free fundamental parameter-based X-ray fluorescence analysis and X-ray reflectometry, Spectrochimica Acta Part B: Atomic Spectroscopy 60(4), 2005, pp. 505–510.
- [8] ROSEN D.L., BROWN D., GILFRICH J., BURKHALTER P., Multilayer roughness evaluated by X-ray reflectivity, Journal of Applied Crystallography 21(2), 1988, pp. 136–144.
Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.baztech-article-BPW7-0012-0111