Chemical Vapour Deposition (CVD) of metallic layers prepared from silver carboxylates complexes with tertiary phosphines

• Autorzy: Szczęsny, R. , Szymańska, I. , Piszczek, P. , Dobrzańska, L. , Szłyk, E.
• Języki publikacji: EN

Abstrakty

EN

Silver fluorocarboxylate tertiary phosphines complexes [Ag(O2CR)(PR,3)] (where R = CF3, C2F5, Me3SiCH2; R, = Me, Et) have been used as precursors in the hot-wall Chemical Vapour Deposition (CVD) of silver films. Pyrolysis of Ag(I) compounds and thermal stability of metallic species transported in the gas phase were characterized by temperature variable IR (VT-IR) and MS (MS-EI) methods. Metallic films were produced between 403 and 423 K under deposition pressure 0.8 2.0 mbar, under Ar atmosphere, on Si(111) substrates. They were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM) integrated with EDX equipment.

Słowa kluczowe

EN

silver carboxylate; tertiary phosphine; silver films; chemical vapour deposition

• Czasopismo: Materials Science Poland
• Rocznik: 2005
• Tom: Vol. 23, No. 3
• Strony: 671--676
• Opis fizyczny: Bibliogr. 13 poz., rys.

Twórcy

autor

Szczęsny, R.

autor

Szymańska, I.

autor

Piszczek, P.

autor

Dobrzańska, L.

autor

Szłyk, E.

• Faculty of Chemistry, Nicolaus Copernicus University, ul. Gagarina 7, 87-100 Toruń,

Bibliografia

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