DLC layers prepared by the PVD magnetron sputtering technique

• Autorzy: Wojciechowski, K. T. , Zybala, R. , Mania, R. , Morgiel, J.
• Języki publikacji: EN

Abstrakty

EN

magnetron sputtering technique. Design/methodology/approach: DLC layers were fabricated by the reactive pulsed magnetron sputtering method in the mixture of Ar and methane (CH4). The gas pressure during sputtering process ranged from 0.3 to 0.7 Pa. The DLC layers were deposited on selected thermoelectric, ceramic and metallic substrates. Microstructure of obtained DLC layers were characterised by TEM and SEM microscopy. Raman spectroscopy was also used to characterise the different forms of carbon in the films. Findings: Structural investigations showed amorphous character of the produced layers and the lack of presence of nano-crystalline diamond phase both in layers obtained at 35 °C and in higher temperatures. Raman spectroscopy studies confirmed the dominant share of sp2 hybridization in the C - C and the presence of C – H bonds. Obtained layers are characterized by high electrical resistivity. Practical implications: Microstructure and high resistivity of DLC layers, prepared by magnetron technique, give prospective of their applications e.g. in microelectronics. Originality/value: Microstructure and high resistivity of DLC layers, prepared by magnetron technique, give perspectives for their applications e.g. in microelectronics.

Słowa kluczowe

PL

DLC; spektroskopia ramanowska; napylanie magnetronowe

EN

DLC; Raman spectroscopy; magnetron sputtering

• Czasopismo: Journal of Achievements in Materials and Manufacturing Engineering
• Rocznik: 2009
• Tom: Vol. 37, nr 2
• Strony: 726-729
• Opis fizyczny: Bibliogr. 15 poz., rys., tabl.

Twórcy

autor

Wojciechowski, K. T.

autor

Zybala, R.

autor

Mania, R.

autor

Morgiel, J.

• AGH University of Science and Technology, Faculty of Materials Science and Ceramics, Department of Inorganic Chemistry, Al. Mickiewicza 30, 30-059 Kraków, Poland,

Bibliografia

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