Influence of the vacuum-arc source configuration and arc discharge parameters on the evolution and location of arc spots on the cathode surface

• Autorzy: Walkowicz, J. , Smolik, J. , Słomka, Z. , Kułakowska-Pawlak, B. , Żyrnicki, W.
• Języki publikacji: EN

Abstrakty

EN

Purpose: The paper presents investigations of the evolution, structure and location of arc spots on the cathode frontal surfaces of two types of industrial arc sources. Design/methodology/approach: The temporal behaviour of cathode spots was recorded with the use of a fast CCD camera. The experiments were performed at four values of arc current, nine compositions of the process atmosphere N2+C2H2 and three pressure ranges of the process atmosphere. Findings: The analysis of the recorded pictures revealed the fine structure of the arc discharge for the investigated range of process conditions. Both temporal and spatial behaviour of cathode spots were different for both investigated arc sources. The correspondence between radial distributions of the cathode spots on the cathode surface and radial distribution of plasma flow elements analysed in the volume of the vacuum chamber was revealed. Research limitations/implications: The paper show experimental methodology that can be used for the research of the specificity of cathode spots movement on the cathodes made from different materials. Originality/value: The originality of the research presented in the paper consists in assigning overall correlation between vacuum-arc source configuration and parameters of vacuum-arc discharge – on the one hand, and space-time behaviour of the arc spots during their movement on the circular cathode surface and radial distribution of excited and ionized atoms of the cathode material in the deposition chamber – on the other.

Słowa kluczowe

PL

cienka powłoka; gruba powłoka; odparowanie łukowe; tytan; zachowanie katody

EN

thin coating; thick coating; arc evaporation; titanium; cathode spots behaviour

• Czasopismo: Journal of Achievements in Materials and Manufacturing Engineering
• Rocznik: 2009
• Tom: Vol. 37, nr 2
• Strony: 719-725
• Opis fizyczny: Bibliogr. 15 poz., rys., tabl.

Twórcy

autor

Walkowicz, J.

autor

Smolik, J.

autor

Słomka, Z.

autor

Kułakowska-Pawlak, B.

autor

Żyrnicki, W.

• Institute of Mechatronics, Nanotechnology and Vacuum Technique, Koszalin University of Technology, ul. Racławicka 15-17, 75-620 Koszalin, Poland,

Bibliografia

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