Correlation between spatial distribution of the components of reactive plasma flow and the stoichiometry and defectiveness of deposited coatings

• Autorzy: Walkowicz, J. , Smolik, J. , Brudnias, R. , Kułakowska-Pawlak, B. , Żyrnicki, W.
• Języki publikacji: EN

Abstrakty

EN

Purpose: The subject of the presented research was reactive plasma generated by circular vacuum-arc sources used for deposition of thin hard coatings. Design/methodology/approach: Experimental investigations on spatial distribution of ionized and excited plasma components were performed with the use of the optical emission spectroscopy. Quantitative analysis of microdroplets distribution was carried out using measuring optical microscope supplied with the numerical image analysis system. Findings: Based on the obtained radial distributions of volatile and condensed components the general picture of plasma flow emitted by a single circular arc source was reconstructed. Radial distributions of analysed emitting elements and analysed fractions of microdroplets showed layered structures that depended on the discharge conditions. Research limitations/implications: The spectral method used for the reconstruction of concentration distributions of ionised and excited plasma components generated by a single circular arc source could not be used for reconstruction of such distributions in the vacuum chamber of the industrial device. Originality/value: The carried out investigations showed that the differences in spatial distributions of plasma active elements determine the uniformity of crystallization conditions in vacuum-arc deposition processes performed in large-scale multi-source industrial devices.

Słowa kluczowe

PL

cienka powłoka; gruba powłoka; odparowanie łukowe; azotek tytanu; azotek węgla; kolorymetria

EN

thin coating; thick coating; arc evaporation; titanium nitride; carbonitride; colorimetry

• Czasopismo: Journal of Achievements in Materials and Manufacturing Engineering
• Rocznik: 2009
• Tom: Vol. 37, nr 2
• Strony: 712-718
• Opis fizyczny: Bibliogr. 15 poz., rys., tabl.

Twórcy

autor

Walkowicz, J.

autor

Smolik, J.

autor

Brudnias, R.

autor

Kułakowska-Pawlak, B.

autor

Żyrnicki, W.

• Institute of Mechatronics, Nanotechnology and Vacuum Technique, Koszalin University of Technology, ul. Racławicka 15-17, 75-620 Koszalin, Poland,

Bibliografia

• [1] R. L. Boxman, P. J. Martin, D. M. Sanders, Handbook of vacuum arc science and technology, Fundamentals and applications, Noyes Publications, Park Ridge, 1995.
• [2] D. L. Smith, Thin-film deposition, Principles and Practice. McGraw-Hill, Inc., New York-San Francisco- Washington D.C.-Auckland-Bogotá-Caracas-Lisbon- London-Madrid-Mexico City-Milan-Montrea-New Delhi- San Juan-Singapore-Sydney-Tokyo-Toronto, 1995.
• [3] E. Hantzsche, A hydrodynamic model of vacuum arc plasmas, IEEE Transactions on Plasma Science 20 (1992) 34-41.
• [4] B. Kułakowska-Pawlak, J. Walkowicz, W. Żyrnicki, J. Smolik, Plasma parameters in some industrial vacuum arc deposition systems, Vacuum 78 (2005) 59-66.
• [5] J. Kusiński, M. Rozmus, J. Bujak, Investigation of the life-time of drills covered with the anti-wear Cr(C, N) complex coatings, deposited by means of Arc-PVD technique, Journal of Achievements in Materials and Manufacturing Engineering 33/1 (2009) 86-93.
• [6] A. J. Novinrooz, H. Seyedi, M. M. Larijani, Microhardness study of Ti(C, N) films deposited on stainless steel 316 by the hallow cathode discharge gun, Journal of Achievements in Materials and Manufacturing Engineering 14 (2006) 59-63.
• [7] L. A. Dobrzański, M. Staszuk, M. Pawlyta, W. Kwaśny, M. Pancielejko, Characteristic of Ti(C,N) and (Ti,Zr)N gradient PVD coatings deposited onto sintered tool materials, Journal of Achievements in Materials and Manufacturing Engineering 31/2 (2008) 629-634.
• [8] A. Bielski, W. Kaczmarek, J. Kubrycht, J. Wolnikowski, On the determination of the radial intensity distribution of radiation in cylindrical plasma, Acta Physica Polonica 33 (1968) 701-705.
• [9] J. Walkowicz, Plasma physico-chemical structure and composition of coatings created with the use of plasma assisted surface engineering methods, Publishing House of the Institute for Sustainable Technologies, Radom, 2003 (in Polish).
• [10] A. J. Perry, The color of TiN and HfN, Aging effects, Journal of Vacuum Science and Technology A 4 (1986) 2670-2673.
• [11] A. J. Perry, M. Georgson, C. G. Ribbing, The reflectance and color of titanium nitride, Journal of Vacuum Science and Technology A 4 (1986) 2674-2679.
• [12] A. J. Perry, On the existence of point defects in physical vapor deposited films of TiN, ZrN, and HfN, Journal of Vacuum Science and Technology A 6 (1988) 2140-2145.
• [13] J. Walkowicz, J. Smolik, Z. Słomka, B. Kułakowska-Pawlak, W. Żyrnicki, Influence of the vacuum-arc source configuration and arc discharge parameters on the evolution and location of arc spots on the cathode surface, Journal of Achievements in Materials and Manufacturing Engineering (2009) (in Print).
• [14] I. I. Demidenko, N. S. Lomino, W. D. Ovcharenko, W. G. Padalka, G. N. Polakova, On the mechanism of the reactive gas ionization in the vacuum-arc discharge, Journal of Technical Physics 54 (1984) 1534-1539 (in Russian).
• [15] J. Walkowicz, On the mechanisms of diode plasma nitriding in N2-H2 mixtures under DC-pulsed substrate biasing, Surface and Coatings Technology 174-175 (2003) 1211-1216.