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2009 | Vol. 37, nr 2 | 369-374
Tytuł artykułu

Thermal stability and mechanical properties of sputtered Chromium-Molybdenum-Nitride (CrMoN) coatings

Wybrane pełne teksty z tego czasopisma
Warianty tytułu
Języki publikacji
EN
Abstrakty
EN
Purpose: The purpose of paper is to determinate thermal stability and mechanical properties of sputtered chromium-molybdenum-nitride (CrMoN) coatings. Design/methodology/approach: We have deposited 1.8 m-thick ternary Cr0.5Mo0.5N1.0 films on a CoCrMo alloy using a RF dual magnetron sputtering system, with Cr and Mo targets and N2 as the reactive gas. These films were subjected to various thermal treatments in Ar, air, and microwave plasma. The hardness, Young’s modulus, surface roughness, microstructure, and composition of films were studied by nanoindentation, AFM, x-ray diffraction, and x-ray photoelectron spectroscopy. Findings: The as-prepared CrMoN films consist of an amorphous Cr-rich nitride matrix with Mo-rich nitride crystalline grains, about 15 nm in size. These films are thermally stable up to 600şC in air. Thermal annealing in the air at 800şC resulted in an increase in surface roughness and hardness, due to film oxidation, with Cr2O3 as the main crystalline phase. Plasma treatment in a H2/N2 gas mixture, at 800şC, did not lead to grain growth. Instead, the existing grains were reduced to about 10 nm and a new nanocrystalline phase has been formed. This leads to a decrease in the surface roughness, and an increase in the film hardness. In addition, we have further modified the film properties through a combined thermal treatment process. Thermal annealing in the air at 800şC, followed by microwave plasma treatment at 800şC resulted in a film with decreased surface roughness, and improved mechanical properties. Reversing the order of the thermal treatments resulted in a further decrease in surface roughness, but it shows a reduction in the mechanical properties. Research limitations/implications: The present investigation was carried out with only one composition, Cr0.5Mo0.5N1.0, of ternary thin-film system. Originality/value: The combination of thermal and plasma treatments can be used to control the microstructure, surface topography, and mechanical properties of ternary CrMoN films. Such post-deposition treatments can further improve the materials properties for desired application, and to produce new nanocomposite materials with technologically important combination of properties.
Wydawca

Rocznik
Strony
369-374
Opis fizyczny
Bibliogr. 18 poz., rys., tabl.
Twórcy
autor
autor
  • Department of Physics, University of Alabama at Birmingham, 1530 3rd Ave S, Birmingham, AL 35294, USA, yujiaoz@uab.edu
Bibliografia
  • [1] C. Wiemer, Structural and electronic properties of hard transition metal nitrides: Ti1-xVxNyand Ti1-xMoxNx sputtered thin films. Thesis Nr. 1535, EPFL, 1996.
  • [2] H. A. Jehn, F. Thiergarten, E. Ebersbach, D. Fabian, Characterization of PVD titanium chromium nitride hard coatings, Surface and Coatings Technology 50 (1991) 45.
  • [3] P. Hones, R. Sanjines, F. Levy, Sputter deposited chromium nitride based ternary compounds for hard coatings, Thin Solid Films 332 (1998) 240-246.
  • [4] L. A. Dobrzański, K. Lukaszkowicz, D. Pakuła, J. Mikuła, Corrosion resistance of multilayer and gradient coatings deposited by PVD and CVD techniques, Archives in Materials Science and Engineering 28 (2007) 12-18.
  • [5] M. Polok-Rubiniec, L. A. Dobrzański, M. Adamiak, The properties and wear resistance of CrN PVD coatings, Journal of Achievements in Materials and Manufacturing Engineering 30 (2008) 165-171.
  • [6] D. H. Jung, H. S. Park. H. D. Na, J. W. Lim, J. J. Lee, J. H. Joo, Mechanical properties of (Ti, Cr) N coatings deposited by inductively coupled plasma assisted direct current magnetron sputtering, Surface and Coatings Technology 169-170 (2003) 424-430.
  • [7] J. J. Nainaparampil, J. S. Zabinski, A. Korenyi-Both, Formation and characterization of multiphase film properties of (Ti-Cr)N formed by cathodic arc deposition, Thin Solid Films 333 (1998) 88-94.
  • [8] S. Ulrich, H. Holleck, J. Ye, H. Leiste, R. Loos, M. Stuber, P. Pesch, S. Sattel, Influence of low energy ion implantation on mechanical properties of magnetron sputtered metastable (Cr,Al)N thin films, Thin Solid Films 437 (2003) 164-170.
  • [9] J. Vetter, E. Lugsheider, S. S. Guerreiro, (Cr:Al)N coatings deposited by the cathodic vacuum arc evaporation, Surface and Coatings Technology 98 (1998) 1233-1239.
  • [10] E. Martinez, R. Sanjines, A. Karimi, J. Esteve, F. Levy, Mechanical properties of nanocomposite and multilayered Cr-Si-N sputtered thin films, Surface and Coatings Technology 180-181 (2004) 570-576.
  • [11] J. Almer, M. Oden, G. Hakansson, Microstructure, stress and mechanical properties of arc-evaporated Cr-C-N coatings, Thin Solid Films 385 (2001) 190.
  • [12] S. H. Yao,Y. L. Su, The tribological potential of CrN and Cr(C,N) deposited by multi-arc PVD process, Wear 212 (1997) 85-94.
  • [13] B. Rother, H. Kappl, Effects of low boron concentrations on the thermal stability of hard coatings, Surface and Coatings Technology 96 (1997) 163-168.
  • [14] M. Cekada, P. Panjan, B. Navinsek, F. Cvelbar, Characterization of (Cr,Ta)N hard coatings reactively sputtered at low temperature, Vacuum 52 (1999) 461-467.
  • [15] R. Saha, R. B. Inturi, J. A. Barnard, Structural and mechanical characterization of Cr-Ta-N hard coatings prepared by reactive magnetron sputtering, Surface and Coatings Technology 82 (1996) 42-47.
  • [16] J. N. Tan, J. H. Hsieh, Deposition and characterization of (Nb,Cr)N thin films by unbalanced magnetron sputtering,Surface and Coatings Technology 167 (2003) 154-160.
  • [17] F. Regent, J. Musil, Magnetron sputtered Cr-Ni-N and Ti-Mo-N films, comparison of mechanical properties, Surface and Coatings Technology 142-144 (2001) 146-151.
  • [18] K. Ho Kim, E. Y. Choi, S. G. Hong, B. G. Park, J. H. Yoon, J. H. Yong, Syntheses and mechanical properties of Cr-Mo-N coatings by a hybrid coating system, Surface and Coatings Technology 201 (2006) 4068-4072.
Typ dokumentu
Bibliografia
Identyfikatory
Identyfikator YADDA
bwmeta1.element.baztech-article-BOS2-0021-0034
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