Influence of duration time of CVD process on emissive properties of carbon nanotubes films

• Autorzy: Stępińska, I. , Kozłowski, M. , Radomska, J. , Wronka, H. , Czerwosz, E. , Sobczak, K.
• Języki publikacji: EN

Abstrakty

EN

In this paper various types of films made of carbon nanotubes (CNTs) are presented. These films were prepared on different substrates (Al₂O₃, Si n-type) by the two-step method. The two-step method consists of physical vapor deposition step, followed by chemical vapor deposition step (PVD/CVD). Parameters of PVD process were the same for all initial films, while the duration times of the second step – the CVD process, were different (15, 30 min.). Prepared films were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and field emission (FE) measurements. The I-E and F-N characteristics of electron emission were discussed in terms of various forms of CNT films. The value of threshold electric field ranged from few V/μm (for CNT dispersed rarely on the surface of the film deposited on Si) up to ~20 V/μm (for Al₂O₃ substrate).

Słowa kluczowe

EN

carbon nanotube film; field emission; SEM; TEM

• Czasopismo: Materials Science Poland
• Rocznik: 2015
• Tom: Vol. 33, No. 1
• Strony: 36--46
• Opis fizyczny: Bibliogr. 23 poz., rys., tab.

Twórcy

autor

Stępińska, I.

• Tele and Radio Research Institute, Ratuszowa 11, 03-450 Warsaw, Poland,

autor

Kozłowski, M.

• Tele and Radio Research Institute, Ratuszowa 11, 03-450 Warsaw, Poland
• Institute of Physics PASc., al. Lotników 32/46, 02-668 Warsaw, Poland

autor

Radomska, J.

• Tele and Radio Research Institute, Ratuszowa 11, 03-450 Warsaw, Poland

autor

Wronka, H.

• Tele and Radio Research Institute, Ratuszowa 11, 03-450 Warsaw, Poland

autor

Czerwosz, E.

• Tele and Radio Research Institute, Ratuszowa 11, 03-450 Warsaw, Poland

autor

Sobczak, K.

• Institute of Physics PASc., al. Lotników 32/46, 02-668 Warsaw, Poland

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Identyfikatory

DOI

10.1515/msp-2015-0023