The ITO thin films deposited by magnetron sputtering for solar cell applications

• Autorzy: Szindler, Marek , Szindler, Magdalena M. , Lukaszkowicz, Krzysztof , Matus, Krzysztof , Nosidlak, Natalia , Jaglarz, Janusz , Fijalkowski, Mateusz , Nuckowski, Paweł
• Języki publikacji: EN

Abstrakty

EN

The paper presents the results of research on the surface topography and electrical properties of ITO thin films deposited by PVD for applications in silicon photovoltaic cells. The surface condition and chemical composition were characterized using a scanning electron microscope and the thickness and optical constants were measured using a spectroscopic ellipsometer. To compare the impact of the preparation process on the properties of layers, deposition was carried out at three different temperatures: 25, 200, and 400◦C. As the temperature increased, the surface roughness changed, which correlated with the results of structural tests. The crystallite size increased from 11 to 46 nm. This, in turn, reduced the surface resistance. The electrical properties were measured using a four-point probe method and then the prepared solar cells containing ITO thin films in their structure were examined. By controlling the deposition parameters, the surface resistance of the deposited layer (26 Ohm/✷) and the efficiency of the prepared solar cells (18.91%) were optimized. Currently, ITO has the best properties for use in optoelectronics and photovoltaics among the known TCO layers. The magnetron sputtering method is widely used in many industries. Therefore, the authors predict that TCO layers can replace currently used antireflection layers and reduce the number and dimensions of front metal contacts in solar cells.

Słowa kluczowe

PL

inżynieria powierzchni; rozpylanie magnetronowe; fotowoltaika; ogniwa słoneczne krzemowe; ITO

EN

surface engineering; magnetron sputtering; photovoltaics; silicon solar cells; ITO

• Czasopismo: Bulletin of the Polish Academy of Sciences. Technical Sciences
• Rocznik: 2024
• Tom: Vol. 72, nr 5
• Strony: art. no. e150803
• Opis fizyczny: Bibliogr. 28 poz., rys., tab.

Twórcy

autor

Szindler, Marek

• Scientific and Didactic Laboratory of Nanotechnology and Material Technologies, Faculty of Mechanical Engineering,Silesian University of Technology, ul. Towarowa 7, 44-100 Gliwice, Poland,

autor

Szindler, Magdalena M.

• Department of Engineering Materials and Biomaterials, Silesian University of Technology, ul. Konarskiego 18a, 44-100 Gliwice, Poland

autor

Lukaszkowicz, Krzysztof

• Department of Engineering Materials and Biomaterials, Silesian University of Technology, ul. Konarskiego 18a, 44-100 Gliwice, Poland

autor

Matus, Krzysztof

• Materials Research Laboratory, Silesian University of Technology, ul. Konarskiego 18a, 44-100 Gliwice, Poland

autor

Nosidlak, Natalia

• Department of Physics, Cracow University of Technology, ul. Podchor ˛azych 1, 30-084 Krakow, Poland

autor

Jaglarz, Janusz

• Institute of Materials Engineering, Cracow University of Technology, al. Jana Pawła II 37, 31-864 Krakow, Poland

autor

Fijalkowski, Mateusz

• Institute for Nanomaterials, Advanced Technologies and Innovation, Technical University of Liberec,Studentská 1402/2, 461 17 Liberec, Czech Republic

autor

Nuckowski, Paweł

• Materials Research Laboratory, Silesian University of Technology, ul. Konarskiego 18a, 44-100 Gliwice, Poland

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Identyfikatory

DOI

10.24425/bpasts.2024.150803