Epitaxial graphene perfection vs. SiC substrate quality

• Autorzy: Dominika Teklinska , Kinga Kosciewicz , Kacper Grodecki , Mateusz Tokarczyk , Grzegorz Kowalski , Wlodzimierz Strupinski , Andrzej Olszyna , Jacek Baranowski
• Języki publikacji: EN

Abstrakty

EN

Polytype instability of SiC epitaxial films was the main focus of attention in the experiment performed since this factor has a decisive influence on graphene growth, which was the second stage of the experiment. Layers deposited in various initial C/Si ratios were analyzed. Our observations indicate that the initial C/Si ratio in epitaxial growth is a crucial parameter determining which polytype will be grown, in particular for cubic (3C) or hexagonal (4H) polytypes. If the initial C/Si ratio was close to its final value, the dominant polytype was 4H. On the other hand, when the initial C/Si ratio was close to zero, 3C became the major polytype in spite of a non favourable growth temperature. The results for graphene growth on an epi-SiC layer and a bulk substrate, in which case the dominant polytype was 4H, are also presented. These results indicate that layers on epitaxial 4H-SiC are thicker, more relaxed and have better quality in comparison with samples on 4H-SiC substrates. Morphology and defects in SiC epilayers were analyzed using Nomarsky optical microscopy, scanning electron microscopy (SEM) and high resolution X-ray diffraction (XRD). Graphene quality was characterized by Raman spectroscopy.

Słowa kluczowe

EN

silicon carbide; SiC; graphene; C/Si ratio; CVD

• Czasopismo: Open Physics
• Rocznik: 2011
• Tom: 9
• Numer: 2
• Strony: 446-453

Daty

wydano

2011-04-01

online

2011-02-20

Twórcy

autor

Dominika Teklinska,

autor

Kinga Kosciewicz

autor

Kacper Grodecki

autor

Mateusz Tokarczyk

• Institute of Experimental Physics, Faculty of Physics, University of Warsaw, 69 Hoza Street, 00-681, Warsaw, Poland

autor

Grzegorz Kowalski

• Institute of Experimental Physics, Faculty of Physics, University of Warsaw, 69 Hoza Street, 00-681, Warsaw, Poland

autor

Wlodzimierz Strupinski

• Institute of Electronic Materials Technology, 133 Wolczynska Street, 01-919, Warsaw, Poland

autor

Andrzej Olszyna

• Faculty of Materials Science, Warsaw University of Technology, 141 Woloska Street, 02-507, Warsaw, Poland

autor

Jacek Baranowski

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Identyfikatory

DOI

10.2478/s11534-010-0136-3