Investigation of the influence of low-concentration hydrogen on the surface potential of thin metallic films for sensor applications

• Autorzy: Joanna Prażmowska , Adam Szyszka , Regina Paszkiewicz , Marek Tłaczała
• Języki publikacji: EN

Abstrakty

EN

In this paper, a study of the influence of hydrogen (concentrations 6 ppm − 1%) on the work function of thin metallic films at moderately elevated temperatures is presented. The work function was measured indirectly by the observation of the surface potential of dedicated test structures using scanning surface potential microscope. Metallic layers with thicknesses of 10, 20, 30, and 50 nm were deposited on semiconductor substrates as well as on a thick gold layer. The investigations were focused on palladium thin films although a comparison to results obtained for platinum layers was also discussed.

Słowa kluczowe

EN

thin metallic films; catalytic dissociation; hydrogen sensors; surface potential microscopy

• Czasopismo: Open Physics
• Rocznik: 2011
• Tom: 9
• Numer: 2
• Strony: 398-403

Daty

wydano

2011-04-01

online

2011-02-20

Twórcy

autor

Joanna Prażmowska

• Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland,

autor

Adam Szyszka

• Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland

autor

Regina Paszkiewicz

• Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland

autor

Marek Tłaczała

• Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego str. 11/17, 50-372, Wroclaw, Poland

Bibliografia

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Identyfikatory

DOI

10.2478/s11534-010-0126-5