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EN
In this paper, design and construction of APF Mather-type plasma focus device (16 kV, 36 μF, and 115 nH) is reported. The design of the system is based on the three-phase theory of the plasma focus formation presented by J.H. Lee. Results of some important experiments to obtain optimum working pressures result in high intensity current pinch at various applied voltages, dependence between the pinch current and the applied voltage at the optimum pressure, and also the focusing time proportional to the gas pressure investigated in this paper. For hollow anode tube, the intensity of HXR shows highly anisotropic behavior. When Al target is installed at the anode tip, the HXR intensity increases and the data shows a large anisotropy, with a maximum intensity between 22.5μ and -22.5μ.
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