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Detection of disease markers in human breath with laser absorption spectroscopy

Stacewicz T., Bielecki Z., Wojtas J., Magryta P., Mikolajczyk J., Szabra D.

Opto-Electronics Review

2016

Vol. 24, No. 2

82--94

Number of trace compounds (called biomarkers), which occur in human breath, provide an information about individual feature of the body, as well as on the state of its health. In this paper we present the results of experiments about detection of certain biomarkers using laser absorption spectroscopy methods of high sensitivity. For NO, OCS, C₂H₆, NH₃, CH₄, CO and CO(CH₃)₂ an analysis of the absorption spectra was performed. The influence of interferents contained in exhaled air was considered. Optimal wavelengths of the detection were found and the solutions of the sensors, as well as the obtained results were presented. For majority of the compounds mentioned above the detection limits applicable for medicine were achieved. The experiments showed that the selected optoelectronic techniques can be applied for screening devices providing early diseases detection.

Towards optoelectronic detection of explosives

Wojtas J., Stacewicz T., Bielecki Z., Rutecka B., Medrzycki R., Mikolajczyk J.

Opto-Electronics Review

2013

Vol. 21, No. 2

210-219

Detection of explosives is an important challenge for contemporary science and technology of security systems. We present an application of NOx sensors equipped with concentrator in searching of explosives. The sensors using CRDS with blue - violet diode lasers (410 nm) as well as with QCL lasers (5.26 µm and 4.53 µm) are described. The detection method is based either on reaction of the sensors to the nitrogen oxides emitted by explosives or to NOx produced during thermal decomposition of explosive vapours. For TNT, PETN, RDX, and HMX the detection limit better than 1 ng has been achieved.

Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target

Rakowski R., Bartnik A., Fiedorowicz H., Jarocki R., Kostecki J., Krzywinski J., Mikolajczyk J., Pina L., Ryc L., Szczurek M., Ticha H., Wachulak P.

Optica Applicata

2006

Vol. 36, nr 4

s. 593--600

In this paper an application of a recently developed laser plasma source of extreme ultraviolet (EUV) for optical measurements of optical characteristics of Mo/Si multilayer mirrors is presented. The source is based on an xenon-helium double-stream gas puff target irradiated with laser pulses from a Nd : YAG laser system (E = 0.55 J, t = 3.9 ns, f = 10 Hz, M 2 = 2.5). The results show that the source can be useful for EUV lithography technologies as a metrology tool in the semiconductor industry.