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1
Content available Plasma characterization of the gas-puff target source dedicated for soft X-ray microscopy using SiC detectors
Torrisi A., Wachulak P., Torrisi L., Bartnik A., Węgrzyński Ł., Fiedorowicz H.
Nukleonika
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2016
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Vol. 61, No. 2
139--143
EN
An Nd:YAG pulsed laser was employed to irradiate a nitrogen gas-puff target. The interaction gives rise to the emission of soft X-ray (SXR) radiation in the ‘water window’ spectral range (λ = 2.3÷4.4 nm). This source was already successfully employed to perform the SXR microscopy. In this work, a Silicon Carbide (SiC) detector was used to characterize the nitrogen plasma emission in terms of gas-puff target parameters. The measurements show applicability of SiC detectors for SXR plasma characterization.
2
Układ do wytwarzania tarcz gazowo-klasterowych wykorzystywanych do oddziaływania promieniowania laserowego z materią
Węgrzyński Ł., Wachulak P., Fok T., Bartnik A., Fiedorowicz H.
Elektronika : konstrukcje, technologie, zastosowania
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2016
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Vol. 57, nr 11
34--37
PL
W artykule przedstawiono budowę, zasadę działania oraz parametry eksperymentalnego układu do wytwarzania tarcz typu gazowo-klasterowego. Tarcze tego typu wykorzystywane są w laboratoriach badawczych na całym świecie do budowy różnego rodzaju źródeł promieniowania w zakresie skrajnego nadfioletu (ang. EUV, extreme ultraviolet) lub promieniowania rentgenowskiego (ang. X-Ray radiation). Prezentowany układ eksperymentalny do wytwarzania tarcz gazowo-klasterowych składa się z układu dwóch zblokowanych elektrozaworów, dedykowanej chłodziarki bazującej na ogniwach Peltiera oraz układu sterującego pracą urządzenia. Konstrukcja została w pełni opracowana oraz wykonana w ramach prac badawczych w Instytucie Optoelektroniki Wojskowej Akademii Technicznej w Warszawie.
EN
Experimental system for gas cluster targets generation are presented. The gas targets and cluster targets has application in many laboratories for extreme ultrafiolet generation or X-Ray radiation. Presented device has consist of an electromagnetic valve system, dedicated thermoelectric cooler and power supply and control unit. The device has been fully developed in Institute of Optoelectronics Military University of Technology.
3
Content available remote Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources
Wachulak P. W., Marconi M. C., Isoyan A., Urbanski L., Bartnik A., Fiedorowicz H., Bartels R. A.
Opto-Electronics Review
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2012
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Vol. 20, No. 1
1-14
EN
Imaging systems with nanometer resolution are instrumental to the development of the fast evolving field of nanoscience and nanotechnology. Decreasing the wavelength of illumination is a direct way to improve the spatial resolution in photon-based imaging systems and motivated a strong interest in short wavelength imaging techniques in the extreme ultraviolet (EUV) region. In this review paper, various EUV imaging techniques, such as 2D and 3D holography, EUV microscopy using Fresnel zone plates, EUV reconstruction of computer generated hologram (CGH) and generalized Talbot self-imaging will be presented utilizing both coherent and incoherent compact laboratory EUV sources. Some of the results lead to the imaging with spatial resolution reaching 50 nm in a very short exposure time. These techniques can be used in a variety of applications from actinic mask inspection in the EUV lithography, biological imaging to mask-less lithographic processes in nanofabrication.
4
Content available remote Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target
Rakowski R., Bartnik A., Fiedorowicz H., Jarocki R., Kostecki J., Krzywinski J., Mikolajczyk J., Pina L., Ryc L., Szczurek M., Ticha H., Wachulak P.
Optica Applicata
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2006
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Vol. 36, nr 4
s. 593--600
EN
In this paper an application of a recently developed laser plasma source of extreme ultraviolet (EUV) for optical measurements of optical characteristics of Mo/Si multilayer mirrors is presented. The source is based on an xenon-helium double-stream gas puff target irradiated with laser pulses from a Nd : YAG laser system (E = 0.55 J, t = 3.9 ns, f = 10 Hz, M 2 = 2.5). The results show that the source can be useful for EUV lithography technologies as a metrology tool in the semiconductor industry.
5
Content available remote X-ray laser emission from a laser-irradiated gas puff target
Fiedorowicz H., Bartnik A.
Bulletin of the Polish Academy of Sciences. Technical Sciences
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2005
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Vol. 53, nr 2
103-111
EN
The paper describes the research on soft X-ray lasers with an active medium created using a gas puff target irradiated with high-intensity laser pulses. The gas puff target in a form of an elongated gas sheet is produced by pulsed injection of gas through a slit nozzle using a high-pressure electromagnetic valve. The method of generation of soft X-ray lasers using a laser-irradiated gas puff target has been developed at the Institute of Optoelectronics. The collaborative experiments were performed at various laser laboratories using high-intensity laser systems to irradiate the gas puff target and pump the X-ray laser active medium. Results of these experiments are presented and discussed. Works aimed at increasing the efficiency of X-ray lasers using a longitudinally irradiated gas puff target are also reviewed.
6
Wytwarzanie cienkich warstw metodą ablacji laserowej w strumieniu gazu
Rakowski R., Bartnik A., Fiedorowicz H., Jarocki R., Kostecki J., Szczurek M.
Elektronika : konstrukcje, technologie, zastosowania
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2001
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Vol. 42, nr 8-9
18-20
EN
Different metal (Sn, Al., steel, Cu, W) thin films were synthesized by reactive pulsed laser deposition on steel, copper and glass wafers. In our work pulsed Nd:glass (10J, 800 us) laser system was used. Jet of gas was created by electromagnetic valve perpendicularly to the laser beam. Nitrogen, oxygene and argon were used. We used several to tens laser shots to obtain visible with the naked eye layers, dependent on metal used to form the layer. Thin layers were observed under an optical microscope.
7
Content available remote Femtosecond-pulse-driven soft X-ray laser studies using a gas puff target irradiated with a Ti:sapphire laser.
Fiedorowicz H., Bartnik A., Szczurek M., Cang Hee Nam, Mocek T., Hyun Joon Shin, Yong Ho Cha, Dong Gun Lee, Kyung Han Hong Kyung Han
Optica Applicata
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2000
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Vol. 30, nr 1
93-102
EN
Preliminary experimental investigations on soft X-ray lasers based on optical field ionization of gases with an ultrashort-pulse terawatt laser system are presented. Both recombination and collisional soft X-ray laser schemes have been studied. An elongated gas puff target formed by pulsed injection of a small amount of gas from a high-pressure electromagnetic valve through a nozzle in a form of a slit was used to create an X-ray laser active medium. The target was irradiated with laser pulses from a 20-fs, 50-mJ Ti:sapphire (Ti:S) laser system. Soft X-ray spectra from nitrogen, oxygen, and xenon targets are presented and discussed.
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