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Morphology and Structure of the Erbium Stabilized Bismuth Oxide Thin Films Deposited by PLD Technique

Kąc S., Szwachta G., Cieniek Ł., Moskalewicz T.

Archives of Metallurgy and Materials

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2019

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Vol. 64, iss. 3

969--974

EN

The aim of the work was to obtain thin bismuth oxide films containing, at room temperature, the Bi1,5Er0,5O3 phase. This phase corresponds to the structure of the high-temperature δ-Bi2O3 phase, in pure bismuth oxide, characterized by the highest ionic conductivity of all known solid state ionic conductors. The high-temperature δ-Bi2O3 phase with the face centered cubic structure, in pure bismuth oxide, occurs only at temperature above 730°C. Stabilization of the δ-Bi2O3 phase at room temperature was achieved by an addition of the erbium together with the employ-ment of the Pulsed Laser Deposition (PLD) technique. The influence of an amount of Er alloying and the film thickness on surface morphology, microstructure, phase composition of thin films were investigated. The velocity of deposition of thin layers of bismuth stabilized with erbium in the PLD process using the Nd: YAG laser was about 0.5 nm/s.The investigation results of erbium doped bismuth oxide thin films deposited onto (0001) oriented Al2O3 monocrystalline substrate are presented. Thin films of uniform thickness, without cracks, and porosity were obtained. All deposited thin films (regardless of the film thickness or erbia (Er2O3) content) exhibited a columnar structure. In films stabilized with erbium, up to approx. 250 nm thickness, the columns have a diameter at the base from 25 to 75 nm. The columns densely and tightly fill the entire volume of the films. With increasing of the film thickness increases, porosity also significantly increases. In thin layers containing from 20 to 30 mole % Er2O3 the main identified phase at room temperature is Bi1,5Er0,5O3. It is similar to the defective fluorite-type structure, and belongs to the Fm-3m space group. This phase corresponds to the structure of the high-temperature δ-Bi2O3 phase in pure bismuth oxide.

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Growth and Characterisation of Pulsed-Laser Deposited Tin Thin Films on Cube-Textured Copper at Different Temperatures

Szwachta G., Gajewska M., Kąc S.

Archives of Metallurgy and Materials

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2016

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Vol. 61, iss. 2B

1031--1038

EN

High-quality titanium nitride thin films have been grown on a cube-textured copper surface via pulsed laser deposition. The growth of TiN thin films has been very sensitive to pre-treatment procedure and substrate temperature. It is difficult to grow heteroexpitaxial TiN films directly on copper tape due to large differences in lattice constants, thermal expansion coefficients of the two materials as well as polycrystalline structure of substrate. The X-Ray diffraction measurement revealed presence of high peaks belonged to TiN(200) and TiN(111) thin films, depending on used etcher of copper surface. The electron diffraction patterns of TiN(200)/Cu films confirmed the single-crystal nature of the films with cube-on-cube epitaxy. The high-resolution microscopy on our films revealed sharp interfaces between copper and titanium nitride with no presence of interfacial reaction.

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Structural and chemical investigation into Ti/TiC coatings deposited with Cold Gas Spraying (CGS)

Kąc S., Szwachta G., Kusiński J., Matteazzi P., Colella A., Dosta S., Fernandez J., Garcia-Forgas J.

Inżynieria Materiałowa

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2014

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Vol. 35, nr 2

150--153

EN

The article presents structural and chemical investigation into Ti/TiC coatings, deposited by using Cold Gas Spraying Technology (CGS) onto titanium aluminium vanadium alloy (TiAlV) substrate. The main issues were to obtain nanostructured coatings with very fine titanium carbides, evenly distributed in the metallic matrix. Nanostructured powder was produced by the High Energy Ball Milling (HEBM), which – applying mechanico-chemical synthesis principles – leads to simultaneous getting of: improvement in material properties, fine phase distribution and uncompleted reaction. Nanostructured particles of 20÷40 μm in size were used during spraying process. The impact energy of nanostructured particles on the substrate was used to induce the uncompleted reactions. The structural investigations were carried out by using three methods: scanning and transmission electron microscopy (with Energy-dispersive X-ray spectroscopy) and X-ray diffraction technique. Results show that the large titanium carbide particles were cracking after impact and did not show a good cohesion to titanium matrix. The fine particles were arranged in coating very densely. The energy-dispersive X-ray spectroscopy (EDS) was used to identify the chemical elements in the coatings. The analysis detected only titanium and carbon. This enabled to distinguish the individual particles in the coating structure. The X-ray diffraction (XRD) was used to identify the phase composition in coatings and revealed only α titanium and titanium carbide phases in coatings.

PL

W artykule przedstawiono analizę struktury i składu chemicznego powłok Ti/TiC uzyskanych metodą natryskiwania na zimno (CGS) na podłoże ze stopu tytan-glin-wanad. Celem pracy było otrzymanie nanostrukturalnych powłok zbudowanych z bardzo drobnych węglików tytanu, równomiernie rozmieszczonych w osnowie tytanu. Nanostrukturalny proszek został wytworzony za pomocą wysokoenergetycznego mielenia (HEBM), które, wykorzystując prawa syntezy mechaniczno-chemicznej, doprowadziło do jednoczesnego uzyskania lepszych własności materiału, drobnodyspersyjnych faz i uzyskania stanu niekompletnej reakcji. Nanostrukturalne cząstki proszku o wielkości 20÷40 μm zostały użyte podczas natryskiwania. Energia uderzenia cząstek nanostrukturalnego proszku o podłoże pozwalała wywołać odpowiednie reakcje zapoczątkowane podczas mielenia. Badania struktury przeprowadzono za pomocą trzech metod: skaningowej i transmisyjnej mikroskopii elektronowej (w tym mikroanalizy rentgenowskiej) i technik dyfrakcji promieniowania X. Wyniki ujawniły, że duże węgliki tytanu po uderzeniu pękają i nie występuje dobra kohezja pomiędzy nimi a tytanową osnową. Z kolei drobne cząstki były równomiernie rozmieszczone w całej objętości powłoki. Powłoki były zwarte i jednorodne. Spektroskopia z dyspersją energii (EDS) została zastosowana w celu analizy składu chemicznego powłok. Potwierdzono obecność tylko tytanu i węgla. Analiza ta (wraz z analizą dyfrakcji elektronowych) pozwoliła, jednoznaczną identyfikację poszczególnych cząstek w strukturze powłoki. Technika dyfrakcji promieniowania rentgenowskiego (XRD) została użyta w celu identyfikacji poszczególnych faz w powłokach. Potwierdzono obecność dwóch faz – Tiα oraz TiC.