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Effect of substrate temperature on the crystal properties of LiMn2O4 films prepared by RF magnetron sputtering

Isai M., Nakamura K., Hosokawa T., Izumichi T., Sekikawa S.

Journal of Automation Mobile Robotics and Intelligent Systems

2009

Vol. 3, No. 4

65-68

The LiMn2O4 films for Li secondary batteries have been prepared by a RF magnetron sputtering method. The LiMn2O4 powder was used as a target material. The deposition rate, XRD, and surface morphology were investigated as a function of substrate temperature (Tsub). It was found that the deposition rate had a peak at around the of 200 °C. This research was also designed for preventing the target material being oxidized during the reactive sputtering process. A quartz tube was inserted between shutter and target. It seems that the quartz tube is effective to prevent oxidation of target material.