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1 Elektronika : konstrukcje, technologie, zastosowania

1 2001

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Modyfikacja powierzchni w procesie elektronowo symulowanej desorpcji

Such B., Kołodziej J., Krok F., Meisel K., Czuba P., Piątkowski P., Struski P., Szymoński M.

Elektronika : konstrukcje, technologie, zastosowania

2001

Vol. 42, nr 8-9

48-50

Alkali halide surface modification due to electron irradiation was investigated with the use of dynamic force microscopy (DFM) and quadrupole mass spectroscopy (QMS). As a result of desorption of atoms from the surface, rectangular pits are created in the topmost layer of the crystal. During irradiation the pits are growing and linking with others what leads to layer-by-layer desorption. Desorption yields of both components exhibit oscillatory dependence on the dose of impinging electrons. Moreover, a correlation has been found between the number of low-coordinated sites on the surface and desorption efficiency. The model is proposed, in which the phenomenon is explained by creation of dynamic equilibrium between competitive processes: (i) desorption and recombination of pairs of defects and (ii) accumulation of F centres in proximity of the surface, which is directed by the topography of the surface.