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Magnetic ordering in ultrathin Co films grown on vicinal substrates

Stupakiewicz A., Gieniusz R., Postava K., Tekielak M., Maziewski A., Szerel I., Wawro A., Baczewski L.T.

Materials Science Poland

2006

Vol. 24, No. 3

659--664

The magnetic anisotropy of ultrathin Au/Co/Au magnetic films epitaxially grown on vicinal monocrystalline (11-20) sapphire substrates with different miscut angles covered with a Mo buffer are investigated by means of ferromagnetic resonance and magnetooptical techniques. Changes of in-plane magnetic anisotropy symmetry were deduced from shape analysis of the magnetization curves and angular dependence of the resonance field measured in the sample plane. Two-fold and four-fold symmetry was observed for different miscut angles. The preference of the domain wall orientation is observed. The experimental data are discussed taking into account the following energy contributions: (i) shape anisotropy; (ii) perpenducular uniaxial anisotropy; (iii) and step-induced uniaxial anisotropy.

Domain structures and magnetization processes in thin Co films with in-plane anisotropy

Jaworowicz J., Kurant Z., Postava K., Maziewski A., Baczewski L.T., Wawro A.

Materials Science Poland

2006

Vol. 24, No. 3

639--642

The magnetization reversal and domain structures in thin Co films in the thickness range 2 nm

Spectral ellipsometry of binary optic gratings

Pištora J., Yamaguchi T., Vlček J., Mistrik J., Horie M., Smatko V., Kováčová E., Postava K., Aoyama M.

Optica Applicata

2003

Vol. 33, nr 2-3

251-262

The coupled wave method (CWM) has been applied to the description of electromagnetic wave propagation in binary optic gratings. The electromagnetic field and the permittivity profile are expanded into two-fold Fourier series. The reflection coefficients of 2D periodical structures have been specified and the ellipsometric angles of the shapes discussed have been computed. The theo-retical results are compared with experimental data obtained on SiO2 square dots on Si substrate. The measurements were performed using computer controlled four zone null ellipsometer in spectral range from 240 nm to 700 nm. The influence of SiO2 ultrathin oxidation layer and thickness of dots on spectral ellipsometric angles is also discussed