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EN
ECR ion sources are used for the production of highly charged ions in various accelerator facilities. In most of them biased electrodes are normally used to increase the ion yield. Physical processes in the plasma of an ion source are quite complicated and the role of a biased electrode is not clear. To investigate the effect of a biased electrode on the intensity of extracted highly charged ions, an axially movable electrode was placed into the plasma chamber of the DECRIS 14-3 ion source. It was found that the intensity of Ar ions depends on the position of the biased electrode and negative bias voltage. The optimal position of the biased electrode was found near the maximum of the magnetic field. Experiments with a pulsed biased electrode were also carried out. The influence of the negative pulse on the ion yield depends on the ion charge state.
EN
The ECR laboratory of the Cyclotron Centrum of Slovak Republic (CC SR) in Bratislava, Slovakia, consists of the DECRIS 14-2m ion source and two low energy channels. It is a complete injector, consisting of an ECR ion source, focusing and steering elements, an analyzing magnet, a vacuum system, and an ion beam diagnostic system. The DECRIS 14-2m ion source is a multiply charged heavy ion source based on the electron cyclotron resonance principle. The ECR ion source DECRIS 14-2m and other system have been designed and manufactured at the FLNR JINR. The preliminary testing (magnetic field measurements, vacuum testing and testing of ECR ion source) has been performed at FLNR JINR. The final assembly of the DECRIS 14-2m will be done at the CC SR in Bratislava.
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