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Structural and optical properties of vanadium oxides prepared by microwave-assisted reactive magnetron sputtering

Sieradzka K., Wojcieszak D., Kaczmarek D., Domaradzki J., Kiriakidis G., Aperathitis E., Kambilafka V., Placido F., Song S.

Optica Applicata

2011

Vol. 41, nr 2

463--469

In this work, structural and optical properties of vanadium oxides have been presented. Thin films were manufactured by microwave-assisted magnetron sputtering process. Particles were sputtered from a vanadium target in Ar/O2 atmosphere. Oxygen partial pressure was changing from 3×10-4 to 7×10-4 Torr. After the deposition, the thin films were additionally annealed at 400 °C in ambient air in order to oxidize the films. Structural investigation was performed with the aid of X-ray diffraction measurements and Raman spectroscopy. The results obtained from both methods have revealed that as-deposited films were amorphous, while annealed films had V2O5 crystal form. Optical properties were determined by transmission measurements in the spectral range from 250 to 2500 nm. As-deposited films had low transmission (below 10%), but oxidization by additional annealing of the structure resulted in the increase of the transmission level up to about 20 and 43% at 650 nm wavelength for samples prepared under 3×10-4 and 7×10-4 Torr oxygen partial pressure, respectively. The analysis of the structure and optical properties of the thin films has revealed the influence of deposition parameters on the properties of vanadium oxides.