The homemade MBE03 system for III group nitrides growth by molecular beam epitaxy is described. The MBE03 system is used for gallium, indium and aluminium nitrides growth with ammonia as the nitrogen gas source. The growing layer can be doped by magnesium (type p) and silicon (type n).
Urządzenie MBE03 przeznaczone jest do wytwarzania warstw azotków takich metali jak: aluminium, gal i ind. Jako źródło azotu zastosowano amoniak. Istnieje także możliwość domieszkowania wytwarzanych warstw magnezem (domieszka typu p) i krzemem (domieszką typu n).
EN
The homemade MBE03 system for III group nitrides growth by molecular beam epitaxy is described. The MBE03 system is used for gallium, indium and aluminium nitrides growth with ammonia as the nitrogen gas source. The growing layer can be doped by magnesium (type p) and silicon (type n).
The construction of the MBE system for growth the semiconductor thin film in the high and ultra high vacuum conditions has been presented. This system consists of mainly technological and loading chambers with technical equipments for operation the epitaxy process. To the pumping of the chambers the turbomolecular with diaphram pumps and the ion pumps are used.
A construction of an ultra-high manipulator designed for sample rotation SIMS measurements, is presented. Also the triple stage vacuum lock adapted to the SIMS chamber is shown. The manipulator is equipped with sample transfer holder kept on a conical support enabling high precision rotation during experiments.
A construction of an ultra-high vacuum lock and transfer system designed for MBE vacuum chambers, is presented. The two stage vacuum lock consists of shutter valve, introduction chamber, and transfer system based on rotary feed-throughts and transferring rod enabling 1.5 m range transfer. The whole system is bakeable up to 470 K, and the samples can be heated up to 1000 K inside the introduction chamber.
Design and application of multistage cascade microparticle impactor is presented. Nine-stage impactor is composed of a cascade of multi-nozzle set. Particle size distribution is in range of 15 um to 0,2 um. The impactor, pumped by 0,3 dir3/s vacuum pump, has been applied for monitoring of environmental dust contamination.
A construction of an ultra-high manipulator designed for MBE vacuum chambers is presented. Manipulator provides translations along "x" - 30 mm, "y" - 60 mm, "z" - 100 mm, rotation 360° along "z" axis, internal and external tilting mechanism. It is equipped with shutter as well as current and voltage electric feedthroughts. All translations stages, rotation head and shutter are motorised by stepping motors.
The application of ultra high vacuum subassemblies and technologies which has been developed in the frame of Project No 041-06 for Scanning Probe Miscroscopy construction is presented.
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