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EN
Scanning probe microscopy (SPM) since its invention in the 80’s became very popular in examination of many different sample parameters, both in university and industry. This was the effect of bringing this technology closer to the operator. Although the ease of use opened a possibility for measurements without high labour requirement, a quantitative analysis is still a limitation in Scanning Probe Microscopes available on the market. Based on experience of Nano-metrology Group, SPM still can be considered as a tool for quantitative examination of thermal, electrical and mechanical surface parameters. In this work we present an ARMScope platform as a versatile SPM controller that is proved to be useful in a variety of applications: from atomic-resolution STM (Scanning Tunnelling Microscopy) to Multi-resonance KPFM (Kelvin Probe force microscopy) to commercial SEMs (Scanning electron microscopes).
EN
Scanning electron microscopy (SEM) is a perfect technique for micro-/nano-object imaging [1] and movement measurement [2, 3] both in high and environmental vacuum conditions and at various temperatures ranging from elevated to low temperatures. In our view, the magnetic field expanding from the pole-piece makes it possible to characterize the behaviour of electromagnetic micro- and nano-electromechanical systems (MEMS/NEMS) in which the deflection of the movable part is controlled by the electromagnetic force. What must be determined, however, is the magnetic field expanding from the e-beam column, which is a function of many factors, like working distance (WD), magnification and position of the device in relation to the e-beam column. There are only a few experimental methods for determination of the magnetic field in a scanning electron microscope. In this paper we present a method of the magnetic field determination under the scanning electron column by application of a silicon cantilever magnetometer. The micro-cantilever magnetometer is a silicon micro-fabricated MEMS electromagnetic device integrating a current loop of lithographically defined dimensions. Its stiffness can be calibrated with a precision of 5% by the method described by Majstrzyk et al. [4]. The deflection of the magnetometer cantilever is measured with a scanning electron microscope and thus, through knowing the bias current, it is possible to determine the magnetic field generated by the e-beam column in a defined position and at a defined magnification.
EN
The surface roughness of the dental restorations is significant to the denture plaque adhesion. Methods: In this work, we present the complex analysis of the electropolished CoCrW alloy remanium® star (Dentaurum, Germany) samples with laserengraved fiducial marks performed using complementary set of micro- and nanoscopic techniques: optical profilometry (OP), atomic force microscopy (AFM), scanning electron microscopy (SEM) and focused ion beam (FIB) milling. Results: Both mean and RMS roughness of the samples were reduced by electopolishing process, however, the results obtained using OP and AFM exhibited some discrepancies. This was caused by the relatively high local protruding defects developed on the processed surface. The cross-sections of the protrusions were made to analyze the cause of their formation as the EDS elemental content maps revealed that their composition was uniform. We also analyzed the local roughness in the smaller areas free from the defects. Conclusions: In that case, both OP and AFM techniques delivered the same results. Analysis of results showed that various methods used for the surface roughness evaluation have to be used simultaneously to obtain complete and true analysis of the technological CoCrW samples.
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