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EN
The deposition of stoichiometric TiO, films for V2O5/ TiO2 catalysts was investigated. DC magnetron sputtering from ceramic oxide targets in an argon/oxygen atmosphere was chosen as deposition technique. Ceramic TiO 2- x targets with a wide range of oxygen nonstoichiometry were prepared following a standard ceramic procedure starting from TiO, and Ti powders. The effect of oxygen nonstoichiometry on target behaviour upon sputtering was followed by means of the target voltage. Increase of voltage maximum with increasing nonstoichiometry of ceramic target was observed and discussed. Optical properties of layers prepared with different oxygen concentrations in the plasma were investigated.
EN
The paper considers defect disorder models of undoped lanthanum cobaltate, LaCoO(3)-delta, and Sr-doped LaCoO(3-delta, La(1-x)SrCoO(3-delta) (LSC), involving both random defect model and cluster defect model. The models are derived using the nonstoichiometry data reported in the literature. Doubly ionized oxygen vacancies are assumed to be the predominant ionic defects within the entire range of compositions. The effect of Sr content on defect disorder of LSC is discussed in terms of both defect models. Impact of segregationon surface composition of ionic solids in general and LSC materials in particular is briefly outlined. The effect of the interface layer on functional properties of LSC as electrode material is briefly discussed.
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