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A new chemical mechanical slurry for polishing yttrium aluminium garnet material with magnesium oxide, sodium metasilicate pentahydrate and zirconium dioxide abrasive particles

Duc Le Anh, Hieu Pham Minh, Quang Nguyen Minh

Journal of Machine Engineering

2023

Vol. 23, No. 2

174--185

This work provided a new chemical-mechanical polishing mixture with MgO, sodium metasilicate pentahydrate, ZrO2 abrasive particles, and deionized water. With chemical-mechanical slurry (CMS) proposed for polishing yttrium aluminum oxide (Y3Al5O12) the surface reaction layer formed with significantly reduced hardness compared to other Y3Al5O12 materials, these products combine with MgO to form montmorillonites (3MgO–Al2O3–3SiO2–3Y2O3–5Al2O3). With this formation, the surface layer of Y3Al5O12 material becomes soft and is easily removed by ZrO2 abrasive particles under the influence of mechanical polishing, resulting in superfine surfaces generated from the proposed CMS model. The experimental results show that the surface quality with CMS proposed gives the surface quality with Ra = 0.471 nm along with the material removal rate 31 (nm/min). Surface quality is improved by 71% along with a superior material removal rate (increased by 287%) compared to silica slurry. The results show excellent polishing ability from CMS proposed for polishing Y3Al5O12 materials.

Analysis of solid and ionic surface reaction form to surface quality when using chemical-mechanical slurry polishing

Duc Le Anh, Hieu Pham Minh, Mai Nguyen Trong, Trong Thai Van, Quang Nguyen Minh

Journal of Machine Engineering

2022

Vol. 22, No. 4

82--94

The process of removing machining residues using chemical-mechanical slurry (CMS) has an important place in the creation of ultra-precise components in optical devices. Based on this feature, this work investigates the efficiency of the CMS polishing process by comparing the surface reaction modes by the ionic and solid reaction modes when polishing the yttrium aluminum garnet (YAG) and sapphire crystal. The study procedures were conducted to clarify the polishing performance corresponding to these two reaction types. The obtained experiments results show that the balance between the mechanical effect process using CMS polishing technology with chemical effect can be achieved with the ionic reaction mode. The results also show that the ionic surface reaction modes give more uniform material removal than the solid reaction on YAG and sapphire crystal surfaces. Therefore, the surface quality when polished by CMS technology with ionic surface reaction modes is better than that of solid surface reaction.