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2 Optica Applicata

2 2013

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Optical gradient force of cosh-Gaussian with sine-azimuthal and half-space phase modulation

Fu R., Gao X., Shen H., Xin Q, Lu X., Guo L.

Optica Applicata

2013

Vol. 43, nr 4

719--730

The optical gradient force distributions in focal plane of cosh-Gaussian beams with sine-azimuthal variation wavefront and half space phase modulation were investigated. Results show that optical gradient force distributions can be affected considerably by the phase retardation of half-space phase modulation, of a phase parameter that indicates the phase change frequency on an increasing azimuthal angle, and beam parameters in cosh terms of the incident beams. Many gradient force patterns occur, including cross-shape, multiple optical trap arrays, multiple-trap wheel, and many kinds of gradient force lines and curves. Symmetry of the whole gradient force pattern can also be altered remarkably. Above results may find wide applications in optical trapping systems.

Focus shaping of the radially polarized Bessel–Gauss beam with a sine-azimuthal variation wavefront

Gao X, Zhang D., Mei T., Fu R., Zhuang S.

Optica Applicata

2013

Vol. 43, nr 3

567--582

Focusing properties of the radially polarized Bessel–Gauss beam with a sine-azimuthal variation wavefront was investigated by the vector diffraction theory. The wavefront distribution is the sine function of the azimuthal angle with one phase parameter that indicates the phase change frequency. Results show that the focal pattern can be altered by the phase parameter, and many novel focal patterns may occur, such as multiple dark-foci focal pattern, crescent shape, and wheel shape. For case of a higher phase beam, the whole focal pattern turns on a symmetric wheel shape with multiple reduplicate intensity elements. When the phase parameter is an odd number, the number of reduplicate elements equals the phase parameter, while when the phase parameter is an even number, the number of reduplicate elements is two times the phase parameter. In addition, the effect of the phase parameter on the focal pattern is more considerable than that of the beam parameter under low numerical aperture. Under higher numerical aperture, the effect of the beam parameter on the focal pattern gets stronger.