The structure and composition of the passive film on the ferritic stainless steel OH18M2 in organic solvents were investigated. The passive film was formed in protic - CH3OH and aprotic - DMF solvents. The investigation based on the polarisation measurements and surface analysis by use X-ray photoelectron spectroscopy method (XPS).
AlSn20 films were prepared by magnetron sputter deposition in an argon gas plasma. The films were obtained at different working pressures and contents of oxygen in vacuum chamber, as well as at different cathode - substrate distance and sputter rates. The observation of film morphology was carried out with the use of SEM. It was proved that distance cathode - substrate, content of oxygen and gas pressure in vacuum chamber exert significant effect on the morphology of AlSn20 films.
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