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Utilization of the cyclic interferometer in polarization phase-shifting technique to determine the thickness of transparent thin-films

Kaewon Rapeepan, Pawong Chutchai, Chitaree Ratchapak, Lertvanithphol Tossaporn, Bhatranand Apichai

Optica Applicata

2020

Vol. 50, nr 1

69--81

An alternative polarization phase-shifting technique is proposed to determine the thickness of transparent thin-films. In this study, the cyclic interferometric configuration is chosen to maintain the stability of the operation against external vibrations. The incident light is simply split by a non-polarizing beam splitter cube to generate test and reference beams, which are subsequently polarized by a polarizing beam splitter. Both linearly polarized beams are orthogonal and counter-propagating within the interferometer. A wave plate is inserted into the common paths to introduce an intrinsic phase difference between the orthogonal polarized beams. A transparent thin-film sample, placed in one of the beam tracks, modifies the output signal in terms of the phase retardation in comparison with the reference beam. The proposed phase-shifting technique uses a moving mirror with a set of “fixed” polarizing elements, namely, a quarter-wave retarder and a polarizer, to facilitate phase extraction without rotating any polarizing devices. The measured thicknesses are compared with the measurements of the same films acquired using standard equipment such as the field-emission scanning electron microscope and spectroscopic ellipsometer. Experimental results with the corresponding measured values are in good agreement with commercial measurements. The system can be reliably utilized for non-destructive thickness measurements of transparent thin-films.

Properties of transparent oxide thin films prepared by plasma deposition

Domaradzki J., Borkowska A., Kaczmarek D., Prociów L.

Optica Applicata

2005

Vol. 35, nr 3

425-430

In this paper, thin films of TiO2 were deposited onto (100) oriented silicon and glass substrates using low pressure hot target reactive magnetron sputtering (LP HTRS) method. X-ray diffraction (XRD) and optical transmission measurements have been applied to study the influence of substrate type on the microstructure and optical properties of the prepared thin films, respectively. Thin films exhibit the TiO2-anatase crystalline state, which could be confirmed by the appearance of peaks of (101) orientation.