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Zastosowanie technologii plazmowej do nanoszenia powłok na bazie Ni-Cr na podłoże ze stali i modyfikacja ich

Alonceva D.

Przegląd Elektrotechniczny

2010

R. 86, nr 7

42-44

Doświadczalnie stwiedzono, że naniesienie powłok proszkowych PG-10N-01, PG-19N-01 i PGAN-33 metodą detonacji plazmowej z podwójną obróbką powierzchni powoduje powstawanie wielofazowych powłok. Stopienie powłok wiązką elektronów prowadzi do zmian rozkładupierwiastków. Powłoki posiadają mikrotwardość ok. 5 GPa. Metodą transmisyjnej mikroskopii elektronowej ustalono obecność faz amorficznej i krystalicznej.

In the presented work it was empirically demonstrated that depositing PG-10N-01, PG-19N-01 and PGAN-33 (Russia Industrial Standard) powder coatings by plasma jets with the duplex surface treatment according to the parameters resulted in forming multi-phase dense coatings with intermetallic hardening compounds. The surface melting of coatings by electronic beam leads to redistribution of elements. The coatings have high microhardness of the same order of 5 GPŕ. TEM methods reveal that in coatings before irradiation form the amorphous and crystalline phases.

Atmospheric pressure plasma jet for treatment of polymers

Wolter M., Bornholdt S., Häckel M., Kersten H.

Journal of Achievements in Materials and Manufacturing Engineering

2009

Vol. 37, nr 2

730-734

Purpose: Polymers are commonly used as packing materials as well as for optical and microelectronic applications. For these purposes different requirements like impermeability for different gases, scratching firmness and electrical conductivity are demanded. Since, polymers usually do not exhibit these attributes a surface modification is necessary. Design/methodology/approach: This paper describes possibilities for coating of polymers with a cold atmospheric pressure plasma jet (APPJ). Due to the rather low temperature of the process the plasma jet is suitable for the treatment of temperature-sensitive materials with melting points below 150°C. For coating of polymers the organic precursor Hexamethyldisiloxane (HMDSO) has been used to deposit silicon oxide layers on surface. Findings: Spatial distributions of reactive species have been measured by optical emission spectroscopy (OES) in the range between 280 and 1100 nm during the plasma process. The energy influx to the substrate was determined by thermal probe measurements. For the affirmation of the chemical composition of the surface X-ray photon spectroscopy (XPS) has been performed. Practical implications: It could be confirmed that SiOx thin film deposition on polymeric substrate using commercially available APPJ with no internal precursor feeding is possible. Originality/value: The examinations of atmospheric pressure plasma jet for treatment of polymers.