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On-wafer wideband characterization: a powerful tool for improving the IC technologies

Lederer D., Raskin J. P.

Journal of Telecommunications and Information Technology

2007

nr 2

69-77

In the present paper, the interest of wideband characterization for the development of integrated technologies is highlighted through several advanced devices, such as 120 nm partially depleted (PD) silicon-on-insulator (SOI) MOSFETs, 120 nm dynamic threshold (DT) voltage - SOI MOSFETs, 50 nm FinFETs as well as long-channel planar double gate (DG) MOSFETs.