Wyniki wyszukiwania - BazTech

1

Structural and optical properties of aluminium nitride thin films fabricated using pulsed laser deposition and dc magnetron sputtering on various substrates

Virt Ihor, Potera Piotr, Wisz Grzegorz, Dziedzic Andrzej, Cieniek Bogumił, Lopatynskyi Ivan, Frugynskyi Marian

Advances in Materials Science

|

2024

|

Vol. 24, nr 1(79)

5--16

EN

Aluminium nitride thin films were fabricated using pulsed laser deposition and DC magnetron sputtering. Different technological parameters and the effects of different substrates on the optical and structural parameters of AlN samples were studied. An X-ray diffraction study was performed for the layer deposited on the Si3N4 substrate. A high-energy electron diffraction study was also carried out for the layer deposited on a KCl substrate. Transmission spectra of layers on quartz, sapphire, and glass substrates were obtained. An evaluation of the optical band gap of the obtained layers was carried out (Eg form 3.81 to 5.81 eV) and the refractive index was calculated (2.58). The relative density of the film (N1TN-AlN sample) is 1.26 and was calculated using the Lorentz-Lorentz relationship. Layers of aluminium nitride show an amorphous character with a polycrystalline region. It was shown that the properties of AlN films strongly depend on the method, growth conditions, and substrate used.

2

Pulsed laser deposition of ZnO and MoO3 as reflection prohibitors on photovoltaic cell substrate to enhance the efficiency

Selvan P., Jebaraj D. J. J., Hynes N. R. J.

Journal of Achievements in Materials and Manufacturing Engineering

|

2022

|

Vol. 113, nr 2

65--71

EN

Purpose: With the ever-growing demand for conventional fuels, the improvement in the efficiency of the photovoltaic system is the need of the hour. Antireflection coatings enhance the availability of solar power by reducing the percentage of light reflected. A new coating has been developed to improve the solar cell's overall efficiency. This study focuses on enhancing the efficiency of the monocrystalline solar cell when a coating of ZnO-MoO3 is applied at a certain thickness. Design/methodology/approach: A layer of ZnO followed by MoO3 is deposited on a Silicon solar cell substrate using a Pulsed Laser Deposition process. Due to the transmissivity d between the two materials, they act as excellent antireflection coating. The layer thickness has been engineered to lie in the maximum absorption spectrum of monocrystalline silicon solar cells, which is between 400 and 800 nanometers. Findings: Based on the calculation of transmissivities for a given layer thickness of coating material, the coating has been done, and the efficiencies of the coated specimen were compared with the uncoated solar cell. The percentage improvement in the electrical efficiency of a single crystalline silicon solar cell with an anti-reflection coating at 1059 W/m2 is about 35.7%. Research limitations/implications: Among the available antireflection coating materials, the combination that provides better efficiency when coated on top of a solar cell is hard to find. Practical implications: This anti-reflection coating could be a better solution to enhance the overall efficiency of the single crystalline silicon solar cell. Originality/value: Although ZnO and MoO3 coatings have been investigated separately for improvement in solar cell efficiency with varying levels of success, the hybrid coating of ZnO/MoO3 with a performance enhancement of 35.7% is a great leap.

3

On the approach to the analysis of the growth of epitaxial layers by pulsed laser deposition

Pankratov Evgeny L.

Computer Methods in Materials Science

|

2021

|

Vol. 21, No. 4

203--208

EN

This paper considers an analytical approach for the prognosis of mass and heat transport during the growth of epitaxial layers by means of pulsed laser deposition. The approach provides the opportunity to make a prognosis which takes into account the spatial and temporal variations of their parameters and, at the same time, the nonlinearity of these processes. Based on this approach, the influence of the variation of several parameters on the growth process is investigated.

4

Numerical Investigation of the Influence of Pulsed Laser Deposited Tin Thin Film Morphology on Deformation Inhomogeneities

Perzyński K., Zych D., Sitko M., Madej Ł.

Archives of Metallurgy and Materials

|

2020

|

Vol. 65, iss. 2

713--720

EN

In vestigation of influence of TiN thin film morphology on deformation inhomogeneities is an overall subject of the research. Numerical modelling approach that was selected for the study is based on the digital material representation concept, which gives an opportunity to directly replicate columnar microstructure morphology of an investigated thin film. Particular attention in this paper is put on the discussion of the influence of cellular automata neighbourhood on thin-film digital morphologies and their further deformation behaviour. Additionally, an evaluation of representativeness aspects of the digital models, in particular, the analysis of the influence of a number of columns, their dimensions and variations in their properties on the material behaviour during compression tests is also presented. The non-periodic boundary conditions are assumed during the investigation. Obtained data in the form of equivalent stress distributions as well as homogenized stress-strain curves from analyzed case studies are presented and discussed within the paper.

5

Influence of substrate temperature and gas pressure on aluminum oxynitride coatings obtained by pulsed laser deposition

Piwowarczyk J., Jędrzejewski R., Baranowska J.

Materials Science Poland

|

2017

|

Vol. 35, No. 1

254--264

EN

The paper presents results of the investigation on the influence of deposition parameters, such as substrate temperature, total gas pressure and reactive gas composition on the structure, chemical composition and mechanical properties of aluminum oxynitride coatings obtained by pulsed laser deposition (PLD) method. Selection of process parameter ranges, which could be promising for aluminum oxynitride (ALON) coatings deposition, was the main objective of the work. Two series of experiments were carried out with varied pressure and temperature. It was found that from the chemical composition viewpoint, the most promising are atmospheres containing 20 % to 40 % oxygen. The nitrogen to oxygen ratios in the coatings can be controlled by increasing the total pressure or substrate temperature. However, increasing the pressure has a negative effect on the O + N:Al ratio, mechanical properties and quality of the coatings. The influence of temperature is much less drastic and more controllable. Increasing the deposition temperature is much more beneficial since it improves the mechanical properties and can compensate to some extent the negative effect of the total pressure. From the coating quality viewpoint, it is possible to establish an optimum temperature range for which the coatings are characterized by a compact structure and a limited number of droplets.

6

Bi- tri- and few-layer graphene growth by PLD technique using Ni as catalyst

Kalsoom U., Rafique M. S., Shahzadi S., Fatima K., Shaheen R.

Materials Science Poland

|

2017

|

Vol. 35, No. 4

687--693

EN

The objective of the present research work is to optimize the growth conditions of bi- tri- and few-layer graphene using pulsed laser deposition (PLD) technique. The graphene was grown on n-type silicon (1 0 0) at 530 °C. Raman spectroscopy of the grown films revealed that the growth of low defect tri-layer graphene depended upon Ni content and uniformity of the Ni film. The line profile analysis of the AFM micrographs of the films also confirmed the formation of bi- tri- and a few-layer graphene. The deposited uniform Ni film matrix and carbon/Ni thickness ratio are the controlling factors for the growth of bi- tri- or few- layer graphene using pulsed laser deposition technique.

7

Antimicrobial Characteristics of Pulsed Laser Deposited Metal Oxides on Polypropylene Hydroentangled Nonwovens for Medical Textiles

Ramamurthy P., Chellamani K. P., Dhurai B., ThankaRajan S. P., Subramanian B., Santhini E.

Fibres & Textiles in Eastern Europe

|

2017

|

Vol. 25, no. 2 (122)

112--119

EN

In this study, an attempt was made to investigate the antimicrobial activity on polypropylene (PP) hydroentangled nonwoven fabrics coated with transition metal oxides. After etching the nonwoven fabrics with RF plasma, nano-scale coatings of ZnO and CuO were done using the KrF excimer based pulsed laser deposition technique (PLD). Morphological and antimicrobial studies were carried out to elucidate the mechanism of antibiocidal behaviour of the coated fabrics. Results showed significant antibacterial activity of ZnO and CuO coated PP hydroentangled nonwovens with a better activity against gram positive S.aureus than gram negative E.coli. Inherently non-toxic, PP has excellent chemical resistance and the use of specialised PP fibres for hydroentangled nonwovens could offer scope in addition to metal oxide coatings; nano-scale biological materials such as enzymes and drugs could add specific functionality for their use as medical textiles.

PL

W pracy podjęto próbę zbadania aktywności przeciwdrobnoustrojowej polipropylenowych włóknin pokrytych tlenkami metali. Przeprowadzono badania morfologiczne i przeciw- drobnoustrojowe powlekanych włóknin. Wyniki wykazały znaczną aktywność antybakteryjną włóknin pokrytych ZnO i CuO, przy czym wyższą aktywność antybakteryjną zaobserwowano wobec bakterii Gram-dodatnich (Staphylococcus ureus), niż wobec Gram-ujemnych (Escherichia coli). Stwierdzono, że zastosowanie nietoksycznego polipropylenu, który charakteryzuje się bardzo dobrą odpornością chemiczną, do wytwarzania włóknin powlekanych tlenkami metali pozwala na otrzymanie funkcjonalnych produktów medycznych.

8

Influence of atmosphere composition on the structure and properties of aluminum oxynitride coatings deposited by PLD method

Piwowarczyk J., Jędrzejewski R., Baranowska J.

Inżynieria Materiałowa

|

2016

|

Vol. 37, nr 1

23--28

EN

This work presents studies on the influence of oxygen content in reaction atmosphere during pulsed laser deposition on the structure and properties of aluminium oxynitride films. The coatings were grown on monocrystalline Si substrates. Aluminium nitride bulk disk was used as a target. The film deposition took place at room temperature and pressure of 0.5 Pa with varying content of oxygen and nitrogen. Thickness and roughness of the coatings were measured by profilometer. The X-ray diffractometer (XRD) was used for phase analysis of the coatings. Chemical composition was evaluated using X-ray microanalysis (EDS) by means of scanning electron microscopy (SEM). The surface topography was examined using an atomic force microscopy (AFM). Hardness of the coatings was measured by means of nanoindentation. Adhesion was evaluated in microscratch tests and the morphology of the residual scratch was characterized by AFM. Results showed that it was possible to obtain coatings composed of oxynitrides with different stoichiometry. Mechanical properties of the obtained coatings, however, were significantly different from those demonstrated by ALON ceramic. The content of oxygen in the coatings had an influence on the decreasing hardness and Young’s modulus and improved adhesion. There was no influence on thickness and roughness but the lowest number of droplets was noticed in the coatings obtained in pure oxygen.

PL

Celem pracy było zbadanie wpływu zawartości tlenu w atmosferze roboczej na budowę i właściwości powłok z tlenoazotku glinu osadzanych metodą pulsacyjnej ablacji laserowej (PLD).

9

Numerical model of the nanoindentation test based on the digital material representation of the Ti/TiN multilayers

Perzyński K., Wiatr R., Madej Ł.

Materials Science Poland

|

2015

|

Vol. 33, No. 2

348--355

EN

The developed numerical model of a local nanoindentation test, based on the digital material representation (DMR) concept, has been presented within the paper. First, an efficient algorithm describing the pulsed laser deposition (PLD) process was proposed to realistically recreate the specific morphology of a nanolayered material in an explicit manner. The nanolayered Ti/TiN composite was selected for the investigation. Details of the developed cellular automata model of the PLD process were presented and discussed. Then, the Ti/TiN DMR was incorporated into the finite element software and numerical model of the nanoindentation test was established. Finally, examples of obtained results presenting capabilities of the proposed approach were highlighted.

10

Preparation of cubic alumina and scandia doped zirconia and its thin film fabrication by pulsed laser deposition technique

Karthikeyan M

Materials Science Poland

|

2014

|

Vol. 32, No. 1

45--49

EN

Alumina and scandia doped zirconia was prepared through a soft chemistry synthesis route and sintered at 1873 K. X-ray diffraction patterns indicate a pure cubic phase for the composition of 0.88ZrO2–0.112Sc2O3–0.008Al2O3. Thin films were fabricated on Al2O3 <0001> substrates using pulsed laser deposition technique. Dense films of 0.941 m thickness were obtained at 873 and 1023 K substrate temperatures at an oxygen partial pressure of 15 Pa. The ionic conductivity of both thin film and sintered pellet was measured using ac impedance spectroscopy in air. The conductivity values are higher for thin films compared to that of sintered pellets.

11

Preparation and microstructural characterization of Si(100) Ce1−x Gd x O2−δ thin films prepared by pulsed laser deposition technique

Nagaraju P, Vijayakumar Y, Phase D M, Reddy V R

Materials Science Poland

|

2014

|

Vol. 32, No. 4

541--546

EN

Microstructural properties of Ce1−xGdxO2−δ (x = 0 to 0.3) thin films prepared by pulsed laser deposition technique were studied. The thin films were deposited on Si(100) substrate at a substrate temperature of 973 K at the oxygen partial pressure of 0.2 Pa using KrF excimer laser with energy of 220 mJ. The prepared thin films were characterized by X-ray diffraction, Raman spectroscopy and atomic force microscopy. X-ray diffraction analysis confirmed the polycrystalline nature of the thin films. Crystallite size, strain and dislocation density were calculated. The Raman studies revealed the formation of Ce–O with the systematic variation of peak intensity and full width half maxima depending on concentration of gadolinium dopant. The thickness of the films was estimated using Talystep profiler. The surface roughness was estiamted based on AFM.

12

Charakterystyka powłok z tlenoazotku glinu osadzanych metodą PED i PLD

Jędrzejewski R., Piwowarczyk J., Kochmański P., Baranowska J.

Inżynieria Materiałowa

|

2014

|

Vol. 35, nr 6

496--499

PL

W pracy przedstawiono badania nad wytwarzaniem powłok z tlenoazotku glinu z azotku glinu dwoma metodami: PLD (Pulsacyjna Ablacja Laserowa) oraz PED (Pulsacyjna Ablacja Elektronowa) z zastosowaniem atmosfery zawierającej tlen. Ciśnienie tlenu w komorze oraz liczba impulsów była zmieniana w celu oceny wpływu tych parametrów na mikrostrukturę i skład chemiczny powłok. Metodą SEM-EDX/WDX oraz GDOES określono skład chemiczny powłok. Strukturę chemiczną określono metodą FTIR. Wyznaczono grubość powłok oraz zbadano topografię i chropowatość powierzchni. Stwierdzono możliwość otrzymywania cienkich powłok tlenoazotkowych tymi metodami.

EN

The paper presents results of investigation on thin oxynitride coatings deposited by two methods PLD (Pulsed Laser Deposition) and PED (Pulsed Electron Deposition) methods at oxygen atmosphere. Aluminum nitride was used as target. Pressure of oxygen and number of pulses were changed in order to investigate an influence of these parameters on microstructure and chemical composition of coatings. Chemical composition was examined by SEM-EDX/WDX and GDOES methods. Chemical structure was studied by means of FTIR method. Thickness, roughness and topography of coatings were also measured. Ability to deposition of oxinitride coatings by these methods was confirmed.

13

Effects of Al dopant on structural and optical properties of ZnO thin films prepared by sol-gel

Pogrebnjak A. D., Muhammed A. A., Karash E. T., Jamil N. Y., Partyka J.

Przegląd Elektrotechniczny

|

2013

|

R. 89, nr 3b

315--317

EN

Transparent and conductive Al doped ZnO thin films were synthesized at room temperature by sol gel technique both pure ZnO and Aldoped( 1,3,and5%) thin films were deposited on a glass substrate. The sols were prepared using zinc acetate dehydrate and aluminum chloride provides Al ions, played an important role in improvement of the c – axis, the structural characteristics have been studied by X-ray diffraction, and UV–Vis-NIR spectroscopy. The films are transparent from the near ultraviolet to the near infrared, SEM image also showed that the average grain size is decreased with increasing of Al concentration, band gap values of prepared thin films varied in the range of (3.18 – 3.42 eV).

PL

Przejrzyste i przewodzące cienkie warstwy Al domieszkowane ZnO zostały zsyntetyzowane w temperaturze pokojowej techniką zolżel. Na podłożu szklanym naniesiono cienkie warstwy Al niedomieszkowanego oraz domieszkowanego ZnO w stosunku 1, 3, i 5%. Zole zostały przygotowane wykorzystując dwuwodny octan cynku i chlorek aluminium. Jony Al odegrały ważną rolę w ulepszaniu osi c. Charakterystyki stukturalne przebadano metodą dyfrakcji rentgenowskiej i spektroskopii UV-Vis-NIR. Warstwy są przejrzyste od bliskiego ultrafioletu do bliskiej podczerwieni. Obrazy SEM wykazały również, że średni rozmiar ziarna zmniejsza się wraz ze wzrostem poziomu domieszkowania Al. Wartości przerw między pasmami w przygotowanych cienkich warstwach zmieniały się w zakresie (3.18 – 3.42 eV).

14

Effect of low oxygen pressure on structural and magnetic properties of quenched SrFe12O19 thin films

Katlakunta S., Praveena K., Singh R.

Materials Science Poland

|

2013

|

Vol. 31, No. 4

581--586

EN

Strontium hexaferrite thin films have been grown on glass substrates at room temperature in oxygen environment by pulsed laser deposition method. The effect of oxygen pressure (pO2) on the structural and magnetic properties has been investigated. The as-deposited films were found to be amorphous in nature. The crystallization of these films was achieved by annealing at a temperature of 850 °C in air. The thickness of the film increased with pO2. The film grown at pO2 = 0.455 Pa had a clear hexagonal structure. The values of coercivity for the films were found to increase with pO2.

15

Structure and low temperature electrical properties of LaCoO3 perovskite thin film produced by PLD technique

Cieniek Ł., Kusiński J.

Inżynieria Materiałowa

|

2013

|

Vol. 34, nr 4

253--256

EN

LaCoO3 perovskite thin ﬁlms were deposited by pulsed laser deposition technique (PLD) on non-heated Si and MgO single crystal substrates. In the ﬁrst stage the reactive grinding technique (~22 h milling) was applied for production of LaCoO3 nanopowder used afterwards for the preparation of the high quality target (cold pressing and sintering). Thin LaCoO3 ﬁlms were produced by pulse Powerlite Precision II 9010 DLS Nd:YAG laser working with Neocera's Pioneer 180 ablation chamber with the following parameters: laser wavelength 266 nm, pulse energy ~90 mJ, pulse duration 5÷9 ns, number of shots 37 500 at 10 Hz repetition rate. The change of the substrate material resulted in apparent differences in the surface topography and structures of obtained thin films. The microstructure, chemical/phase composition and morphology of prepared thin ﬁlms were examined by means of diverse techniques (SEM, TEM, EDS and XRD). For the surface topography observations of thin ﬁlms the atomic force microscopy (AFM Tapping Mode) was applied. Scratch tests were also perfonned to evaluate the adhesion of perovskite ﬁlms. In the ﬁnal step, the measurements of the low temperature electrical conductivity of LaCoO3 thin ﬁlm deposited on the MgO substrate were carried out. In the analyzed temperature range (801310 K) studied LaCoO3 thin film exhibits p-type semiconductor properties with the change in the concentration of charge carriers clearly marked on the conductivity-temperature curve.

PL

Cienkie warstwy perowskitu LaCoO3 wytworzono techniką ablacji laserowej (impulsową wiązką lasera) na monokrystalicznych podłożach Si oraz MgO bez wstępnego ich podgrzewania. W pierwszym etapie badań wykorzystano technikę reaktywnego mielenia (22 h proces mechanicznego stopowania) do wytworzenia nanoproszku LaCoO3, z którego następnie otrzymano wysokiej jakości target przez połączone zabiegi prasowania na zimno i spiekania. Cienkie warstwy LaCoO3 otrzymano, wykorzystując impulsową wiązkę lasera Nd:YAG Powerlite Precision II 9010 DLS sprzężonego z komorą próżniową Pioneer 180 ﬁrmy Neocera, przy następujących parametrach procesu: długość fali promieniowania laserowego 266 nm, energia pojedynczego impulsu ~90 mJ, czas trwania impulsu 5÷9 ns, liczba strzałów 37 500 dla częstotliwości powtórzeń 10 Hz. Zmiana materiału podłoża w procesie depozycji skutkowała wyrażnymi zmianami struktury i topograﬁi powierzchni otrzymanych warstw. Mikrostrukturę, skład chemiczny i fazowy oraz morfologię wytworzonych cienkich warstw analizowano z wykorzystaniem różnych technik badawczych (SEM, TEM, EDS oraz XRD). Mikroskopię sił atomowych (AFM w trybie tapping) zastosowano do oceny topograﬁi ich powierzchni. Przeprowadzono ponadto testy zarysowań pozwalające na oszacowanie adhezji cienkich warstw LaCoO3 do podłoży. W końcowym etapie przeprowadzono eksperymentalne pomiary przewodności elektrycznej właściwej w zakresie niskiej temperatury dla cienkiej warstwy LaCoO3 wytworzonej na podłożu MgO. W analizowanym zakresie temperatury (801310 K) badana cienka warstwa LaCoO3 wykazuje własności klasycznego półprzewodnika dziurowego (typu p) z wyraźnie zaznaczonym punktem przegięcia na krzywej przewodność-temperatura, świadczącym o ewidentnej zmianie stężenia nośników ładunków.

16

Microstructure of doped Bi2O3 thin ﬁlms deposited by PLD technique

Kąc S., Moskalewicz T.

Inżynieria Materiałowa

|

2013

|

Vol. 34, nr 4

295--298

EN

The paper presents the investigation results of Mo doped Bi2O3 thin ﬁlms obtained by PLD technique, using Nd:YAG laser. Bismuth oxide is the material having wide application in the electronic and optical industry. The objective of our investigation is stabilization of high temperature δ phase to lower temperature, which permits widely take advantage of interesting properties of this material (good ion conductivity, changing conductivity with temperature). The Mo concentration and process parameters inﬂuence on the coating microstructure and properties were studied. The laser energy, the substrate temperature and the oxygen pressure in the vacuum chamber during deposition by PLD process inﬂuence strongly the chemical composition and morphology of deposited ﬁlms. The SEM, TEM, EDS and XRD investigation results of the films microstructure are presented in the paper. The results of investigations carried out indicate that it is possible to transfer stoichiometric composition of Mo doped Bi2O3 from target to substrate. In deposited thin ﬁlms high temperature δ-Bi2O3 phase at room temperature was obtained.

PL

W publikacji przedstawiono wyniki badań cienkich warstw domieszkowanego molibdenem tlenku bizmutu wytwarzanych techniką ablacji laserowej (PLD) z wykorzystaniem lasera impulsowego Nd:YAG. Tlenek bizmutu to materiał szeroko stosowany w przemyśle elektronicznym i optyce. Celem przeprowadzonych badań jest stabilizacja wysokotemperaturowej fazy δ do niższej temperatury, co pozwoli lepiej wykorzystać interesujące własności tego materiału (dobre przewodnictwo jonowe, zmianę przewodności elektrycznej z temperaturą). W pracy badano wpływ koncentracji Mo i parametrów procesu PLD na mikrostrukturę i własności cienkich warstw tlenku bizmutu. Energia wiązki lasera, temperatura podłoża i ciśnienie tlenu w komorze reakcyjnej podczas procesu PLD istotnie wpływają na skład chemiczny i morfologię wytwarzanych warstw. W pracy są prezentowane wyniki badań cienkich warstw za pomocą SEM, TEM, EDS i XRD. Wyniki przeprowadzonych badań wykazują, że jest możliwe stechiometryczne przenoszenie domieszkowanego Mo tlenku bizmutu z odparowanej wiązką lasera tarczy na podłoże. W wytworzonych cienkich warstwach otrzymano wysokotemperaturową fazę δ-Bi2O3 w temperaturze otoczenia.

17

Kinetyka wzrostu powłok Al2O3 osadzanych metodą PED i PLD

Jędrzejewski R., Baranowska J., Bańczerowska P.

Inżynieria Materiałowa

|

2013

|

Vol. 34, nr 5

463--466

PL

Celem pracy było zbadanie kinetyki osadzania powłok dwoma metodami PVD: PLD - pulsacyjną ablacją laserową oraz PED - pulsacyjną ablacją elektronową. Otrzymano serie powłok A120, na podkładzie Si. W zależności od ciśnienia tlenu panującego w komorze przy danej liczbie strzałów otrzymano powłoki o różnej grubości, a więc przy różnej szybkości osadzania. Metodą XRD oraz SEM-EDS potwierdzono obecność A120, na powierzchni. Wykazano, iż dobór ciśnienia panującego w komorze ma istotny wpływ na morfologię powłoki.

EN

The objective of the research was to investigate the kinetics of thin ﬁlm deposition by two PVD methods: PLD - Pulsed Laser Deposition and PED - Pulsed Electron Deposition. A series of Al2O3 coatings on the Si substrate were obtained. Depending on the oxygen pressure in the chamber by a given number of shots coatings with different thickness were obtained, which means with a different deposition rate. The presence of Al203, was confirmed by means of XRD and SEM-EDS methods. lt has been shown that the oxygen pressure in the chamber has a major impact on the morphology of the coatings.

18

Characterization of Ti/TiN multilayer coating deposited using PLD technique

Solecka M., Radziszewska A., Kowalski K., Moskalewicz T.

Inżynieria Materiałowa

|

2013

|

Vol. 34, nr 4

374--377

EN

Tribological multilayer coatings on Ti/TiN basis were deposited by means of the Pulsed Laser Deposition (PLD) technique. The composites were built of six alternately deposited Ti (ca. 25 nm) and TiN (ca. 40 nm) layers with the total thickness of about 200 nm. Several analytical techniques were used to investigate the microstructure and composition of the coatings. Scanning electron microscopy (SEM) analyses showed a uniform coating surface with a few defects in the form of droplets enriched in oxygen. Transmission electron microscopy (TEM) as well as the secondary ion mass spectrometry (SIMS) examinations conﬁrmed the multilayer structure of the Ti/TiN coatings. The chemical composition of the Ti/TiN coatings was investigated by using X-ray photoelectron spectroscopy (XPS). The XPS surface analysis showed the presence of titanium nitride and oxide.

PL

Wielowarstwowe powłoki tribologiczne na bazie Ti/TiN wytworzone zostały metodą osadzania impulsem laserowym (PLD). Powłoki zbudowane były z 6-warstwowego układu naprzemiennie osadzanych warstw Ti (ok. 25 nm) i TiN (ok. 40 nm), przy całkowitej grubości powłoki nieprzekraczającej 200 nm. Do badania mikrostruktury i składu chemicznego użyto wiele technik badawczych. Analiza za pomocą skaningowej mikroskopii elektronowej (SEM) wykazała jednolitą powierzchnię powłoki z nielicznymi wadami w postaci kropli o podwyższonej zawartości tlenu. Transmisyjna mikroskopia elektronowa (TEM), jak również spektroskopia mas jonów wtórnych (SIMS) potwierdziły wielowarstwową strukturę powłok Ti/TiN. Skład chemiczny powłok Ti/TiN badano za pomocą rentgenowskiej spektroskopii fotoelektronów (XPS). Analiza XPS wykazała obecność azotku tytanu i tlenku na powierzchni powłoki.

19

Structural and mechanical properties of boron nitride thin films deposited on steel substrates by pulsed laser deposition

Gocman K., Kałdoński T., Mróz W., Burdyńska S., Prokopiuk A.

Journal of KONES

|

2011

|

Vol. 18, No. 1

149-156

EN

The article presents preliminary results of investigation on structure, morphology and mechanical properties of boron nitride thin films prepared by pulsed laser deposition on various steel substrates. In order to improve adhesion and reduce internal stresses, substrates were subjected to gas nitriding. To increase gas ionization in the chamber and provide the deposited particles with higher energy RF discharge generator was used. Structure and morphology of coatings were examined by atomic force microscopy (AFM) and Fourier transform infrared spectroscopy (FTIR). Mechanical properties like nanohardness (sclerometric) and elastic modulus (using approach curves) were characterized by UNMT. Adhesion of coatings was measured by scratch tests; critical load was determined on the basis of microscopic observation and friction force and acoustic emission runs. On the basis of obtained results, possibility of using steel as substrate for BN thin films deposition was confirmed. Stable, crystalline, multiphase coatings with good adhesion to the steel substrate were obtained. It was also proved that mechanical properties of prepared coatings and their adhesion to the substrates strongly depend on the type of the substrate. In the next stage tribological properties of BN, coatings will be examined in particular in terms of wear resistance and friction coefficient between coatings and steel.

20

Influence of manganese on the structure and morphology of hydroxyapatite coatings deposited using pulsed laser deposition technique

Mróz W., Bućko M., Burdyńska S., Czwartos J., Prokopiuk A., Ślósarczyk A., Wierzchoń T.

Inżynieria Materiałowa

|

2011

|

Vol. 32, nr 4

608-611

EN

Hydroxyapatite and manganese modified hydroxyapatite were deposited on nitrided Ti6Al4V substrates using pulsed laser deposition technique. Three target materials consisted of pure hydroxyapatite, manganese modified hydroxyapatite with Mn content of 0.1 wt % and 0.5 wt % were ablated using ArF excimer laser. The obtained coatings have been analyzed using XRD, FTIR and AFM in order to determine the influence of manganese on their chemical composition, crystallinity, and surface morphology. The analyses revealed that MnHA layers had polycrystalline microstructure and were more hygroscopic than pure HA layers.

PL

Warstwy hydroksyapatytu i hydroksyapatytu modyfikowanego manganem zostały osadzone metodą ablacji laserowej na azotowanych podłożach Ti6Al4V. Wykorzystując laser ekscymerowy ArF osadzono powłoki z trzech materiałów: czystego hydroksyapatytu, hydroksyapatytu modyfikowanego manganem 0,1% mas. oraz manganem 0,5% mas. Otrzymane pokrycia zostały zbadane z wykorzystaniem XRD, FTIR i AMF dla określenia wpływu zawartości manganu na skład chemiczny, krystalografię oraz morfologię powierzchni. Analiza wykazała, iż powłoki z MnHA wykazują mikrostrukturę polikrystaliczną i są bardziej higroskopijne niż powłoki z czystego HA