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1 2013

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CO₂ laser drives extreme ultraviolet nano-lithography : second life of mature laser technology

Nowak K. M., Ohta T., Suganuma T., Fujimoto J., Mizoguchi H., Sumitani A., Endo A.

Opto-Electronics Review

2013

Vol. 21, No. 4

345-354

It was shown both theoretically and experimentally that nanosecond order laser pulses at 10.6 micron wavelength were superior for driving the Sn plasma extreme ultraviolet (EUV) source for nano-lithography for the reasons of higher conversion efficiency, lower production of debris and higher average power levels obtainable in CO₂ media without serious problems of beam distortions and nonlinear effects occurring in competing solid-state lasers at high intensities. The renewed interest in such pulse format, wavelength, repetition rates in excess of 50 kHz and average power levels in excess of 18 kiloWatt has sparked new opportunities for a matured multi-kiloWatt CO₂ laser technology. The power demand of EUV source could be only satisfied by a Master-Oscillator-Power-Amplifier system configuration, leading to a development of a new type of hybrid pulsed CO₂ laser employing a whole spectrum of CO₂ technology, such as fast flow systems and diffusion-cooled planar waveguide lasers, and relatively recent quantum cascade lasers. In this paper we review briefly the history of relevant pulsed CO₂ laser technology and the requirements for multi-kiloWatt CO₂ laser, intended for the laser-produced plasma EUV source, and present our recent advances, such as novel solid-state seeded master oscillator and efficient multi-pass amplifiers built on planar waveguide CO₂ lasers.