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Pulsed laser deposition of ZnO and MoO3 as reflection prohibitors on photovoltaic cell substrate to enhance the efficiency

Selvan P., Jebaraj D. J. J., Hynes N. R. J.

Journal of Achievements in Materials and Manufacturing Engineering

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2022

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Vol. 113, nr 2

65--71

EN

Purpose: With the ever-growing demand for conventional fuels, the improvement in the efficiency of the photovoltaic system is the need of the hour. Antireflection coatings enhance the availability of solar power by reducing the percentage of light reflected. A new coating has been developed to improve the solar cell's overall efficiency. This study focuses on enhancing the efficiency of the monocrystalline solar cell when a coating of ZnO-MoO3 is applied at a certain thickness. Design/methodology/approach: A layer of ZnO followed by MoO3 is deposited on a Silicon solar cell substrate using a Pulsed Laser Deposition process. Due to the transmissivity d between the two materials, they act as excellent antireflection coating. The layer thickness has been engineered to lie in the maximum absorption spectrum of monocrystalline silicon solar cells, which is between 400 and 800 nanometers. Findings: Based on the calculation of transmissivities for a given layer thickness of coating material, the coating has been done, and the efficiencies of the coated specimen were compared with the uncoated solar cell. The percentage improvement in the electrical efficiency of a single crystalline silicon solar cell with an anti-reflection coating at 1059 W/m2 is about 35.7%. Research limitations/implications: Among the available antireflection coating materials, the combination that provides better efficiency when coated on top of a solar cell is hard to find. Practical implications: This anti-reflection coating could be a better solution to enhance the overall efficiency of the single crystalline silicon solar cell. Originality/value: Although ZnO and MoO3 coatings have been investigated separately for improvement in solar cell efficiency with varying levels of success, the hybrid coating of ZnO/MoO3 with a performance enhancement of 35.7% is a great leap.

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Influence of atmosphere composition on the structure and properties of aluminum oxynitride coatings deposited by PLD method

Piwowarczyk J., Jędrzejewski R., Baranowska J.

Inżynieria Materiałowa

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2016

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Vol. 37, nr 1

23--28

EN

This work presents studies on the influence of oxygen content in reaction atmosphere during pulsed laser deposition on the structure and properties of aluminium oxynitride films. The coatings were grown on monocrystalline Si substrates. Aluminium nitride bulk disk was used as a target. The film deposition took place at room temperature and pressure of 0.5 Pa with varying content of oxygen and nitrogen. Thickness and roughness of the coatings were measured by profilometer. The X-ray diffractometer (XRD) was used for phase analysis of the coatings. Chemical composition was evaluated using X-ray microanalysis (EDS) by means of scanning electron microscopy (SEM). The surface topography was examined using an atomic force microscopy (AFM). Hardness of the coatings was measured by means of nanoindentation. Adhesion was evaluated in microscratch tests and the morphology of the residual scratch was characterized by AFM. Results showed that it was possible to obtain coatings composed of oxynitrides with different stoichiometry. Mechanical properties of the obtained coatings, however, were significantly different from those demonstrated by ALON ceramic. The content of oxygen in the coatings had an influence on the decreasing hardness and Young’s modulus and improved adhesion. There was no influence on thickness and roughness but the lowest number of droplets was noticed in the coatings obtained in pure oxygen.

PL

Celem pracy było zbadanie wpływu zawartości tlenu w atmosferze roboczej na budowę i właściwości powłok z tlenoazotku glinu osadzanych metodą pulsacyjnej ablacji laserowej (PLD).

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Charakterystyka powłok z tlenoazotku glinu osadzanych metodą PED i PLD

Jędrzejewski R., Piwowarczyk J., Kochmański P., Baranowska J.

Inżynieria Materiałowa

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2014

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Vol. 35, nr 6

496--499

PL

W pracy przedstawiono badania nad wytwarzaniem powłok z tlenoazotku glinu z azotku glinu dwoma metodami: PLD (Pulsacyjna Ablacja Laserowa) oraz PED (Pulsacyjna Ablacja Elektronowa) z zastosowaniem atmosfery zawierającej tlen. Ciśnienie tlenu w komorze oraz liczba impulsów była zmieniana w celu oceny wpływu tych parametrów na mikrostrukturę i skład chemiczny powłok. Metodą SEM-EDX/WDX oraz GDOES określono skład chemiczny powłok. Strukturę chemiczną określono metodą FTIR. Wyznaczono grubość powłok oraz zbadano topografię i chropowatość powierzchni. Stwierdzono możliwość otrzymywania cienkich powłok tlenoazotkowych tymi metodami.

EN

The paper presents results of investigation on thin oxynitride coatings deposited by two methods PLD (Pulsed Laser Deposition) and PED (Pulsed Electron Deposition) methods at oxygen atmosphere. Aluminum nitride was used as target. Pressure of oxygen and number of pulses were changed in order to investigate an influence of these parameters on microstructure and chemical composition of coatings. Chemical composition was examined by SEM-EDX/WDX and GDOES methods. Chemical structure was studied by means of FTIR method. Thickness, roughness and topography of coatings were also measured. Ability to deposition of oxinitride coatings by these methods was confirmed.

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Kinetyka wzrostu powłok Al2O3 osadzanych metodą PED i PLD

Jędrzejewski R., Baranowska J., Bańczerowska P.

Inżynieria Materiałowa

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2013

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Vol. 34, nr 5

463--466

PL

Celem pracy było zbadanie kinetyki osadzania powłok dwoma metodami PVD: PLD - pulsacyjną ablacją laserową oraz PED - pulsacyjną ablacją elektronową. Otrzymano serie powłok A120, na podkładzie Si. W zależności od ciśnienia tlenu panującego w komorze przy danej liczbie strzałów otrzymano powłoki o różnej grubości, a więc przy różnej szybkości osadzania. Metodą XRD oraz SEM-EDS potwierdzono obecność A120, na powierzchni. Wykazano, iż dobór ciśnienia panującego w komorze ma istotny wpływ na morfologię powłoki.

EN

The objective of the research was to investigate the kinetics of thin ﬁlm deposition by two PVD methods: PLD - Pulsed Laser Deposition and PED - Pulsed Electron Deposition. A series of Al2O3 coatings on the Si substrate were obtained. Depending on the oxygen pressure in the chamber by a given number of shots coatings with different thickness were obtained, which means with a different deposition rate. The presence of Al203, was confirmed by means of XRD and SEM-EDS methods. lt has been shown that the oxygen pressure in the chamber has a major impact on the morphology of the coatings.