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Audio frequency glow discharge - new prospects for deposition of thin films of plasma glasses from organic precursors

Tyczkowski J.

Polish Journal of Applied Chemistry

1998

Vol. 42, nr 2

135-141

A new type of reactor for plasma chemical vapour deposition from organic precursors, activated by audio frequency, is presented. It was found that ion bombardment process and plasma chemical processes are completely separated in the system and they can be idenpendently controlled. This feature makes it possible to produce two types of twin films, namely amorphous insulators (a-I) and amorphous semiconductors (a-S), using the same original compound and a continuous deposition process. The type of deposited material can be selected by only small changes of a coupling capacitance in the system. It seems that the reactor offers new possibilities for thin film technology consisting in preparation of novel class of layer structures formed from twin films of a-I and a-S.